Dynamic Alignment Detection for Imprint Superposition Accuracy

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Solution Overview

Problem

Existing imprint technologies face challenges in achieving high superposition accuracy due to limitations in correcting complex shape deformations, such as arcuate and barrel components, due to space constraints and the inability to arrange sufficient detecting units.

Innovation Solution

The method involves an imprint apparatus with a dynamic alignment detection system that adjusts the position of detectors to measure alignment marks on a substrate as the imprint material fills the mold, allowing for correction of both linear and high-degree components by performing alignment measurements at multiple positions during the filling process.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Manufacturing precision

If multiple detecting units are arranged to correct high-degree shot deformation components, then manufacturing precision improves, but device complexity and space requirements increase

Engineering Contradiction:
Improvesuperposition accuracyVSAvoidnumber of detecting units
Core Design Contradiction:
Manufacturing precisionVSDevice complexity

Solution Approach 1:

The patent employs a movable detector that dynamically changes its position during the filling process. Instead of using multiple fixed detecting units, a single detector moves to different locations to detect alignment marks at various positions, thereby correcting high-degree shot deformation components while avoiding the complexity and space requirements of multiple simultaneous detectors

Inventive Principle:
Principle #15Dynamics

Solution Approach 2:

The detection process is segmented into multiple stages corresponding to different filling progress levels. The detector sequentially detects alignment marks at different positions (e.g., center, intermediate, and peripheral regions) as the filling progresses, allowing comprehensive measurement of shot deformation without requiring all detectors to operate simultaneously

Inventive Principle:
Principle #1Segmentation

2Manufacturing precision

If alignment measurement is performed at multiple positions to correct shot deformation, then manufacturing precision improves, but measurement time increases

Engineering Contradiction:
Improvesuperposition accuracyVSAvoidalignment measurement time
Core Design Contradiction:
Manufacturing precisionVSLoss of time

Solution Approach 1:

The alignment measurement is performed continuously during the filling process rather than as a separate pre-step or post-step. The detector measures alignment marks at multiple positions while the filling is in progress, overlapping the measurement time with the filling time, thereby achieving comprehensive measurement without extending the overall processing time

Inventive Principle:
Principle #20Continuity of useful action

Solution Approach 2:

The detector positions itself at predetermined locations in advance of the actual measurement needed. As the filling progresses to specific stages, the detector is already positioned to immediately detect alignment marks, eliminating positioning delays during the measurement process

Inventive Principle:
Principle #10Preliminary action

Applied Scientific Principles

This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.

Function Achieved in This Case

This approach enhances superposition accuracy by enabling the correction of complex shape deformations, improving the precision of pattern formation on substrates without increasing the overall time required for imprint processing.

Implementation Method 1

detecting a plurality of alignment marks in the contacting while changing a position of a detector for detecting the plurality of alignment marks

Methodology Applied
Scientific EffectOptical detection:

Data Source

PatentUS10901324B2Imprint method, imprint apparatus, and article manufacturing method using the same
Publication Date: 2021.01.26 CANON KK
  • US10901324B2 patent drawing
  • US10901324B2 patent drawing
  • US10901324B2 patent drawing

AI summary

A imprint method includes contacting the pattern formed on the mold M with the imprint material R supplied to a shot on the substrate W; and detecting a plurality of alignment marks AMM and AMW in the contacting while changing a position of a detector for detecting the plurality of alignment marks AMM and AMW formed on the shot on the substrate W in accordance with a progress of filling of the imprint material R into the pattern formed on the mold M.