Dynamic Imaging Resolution for Substrate Processing Monitoring
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Solution Overview
Problem
Existing monitoring systems for substrate processing face high processing loads due to the need for high-quality imaging video during all stages of the process, which can lead to increased computational demands and complexity.
Innovation Solution
A monitoring apparatus that includes an imaging unit, a monitoring data generation unit, and a monitoring condition changing unit. This apparatus captures images of the nozzle and substrate surface, generates monitoring video data, and adjusts the generation conditions, such as resolution and frame rate, based on the specific process stage, allowing for varying image quality according to the processing content.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Measurement precision
If high-quality imaging video is captured throughout the entire substrate process, then monitoring precision is improved, but processing load increases
Solution Approach 1:
The patent applies dynamics by making the imaging quality parameters (resolution and frame rate) variable rather than fixed. The monitoring condition changing unit dynamically adjusts these parameters based on the current process stage, transitioning from high-quality imaging during critical processes to lower-quality imaging during non-critical processes, thereby resolving the contradiction between maintaining monitoring precision and reducing processing load
Solution Approach 2:
The patent directly applies parameter changes by modifying the imaging conditions (resolution and frame rate) according to different process stages. During critical processes like liquid discharge, high resolution and high frame rate are maintained, while during non-critical processes, these parameters are reduced, thus achieving both adequate monitoring precision and reduced processing load
2Measurement precision
If high-resolution video data is generated for all process stages, then monitoring precision is improved, but device complexity increases
Solution Approach 1:
The patent applies local quality by differentiating imaging requirements across different process stages. Instead of uniformly applying high imaging quality throughout, the system provides high resolution only where needed (during critical processes) and accepts lower resolution during non-critical processes, thereby maintaining monitoring precision where necessary while reducing overall system complexity
Solution Approach 2:
The system dynamically adjusts imaging parameters based on process stage, making the monitoring system adaptable rather than statically complex. This dynamic adjustment capability allows the system to maintain precision when needed without the permanent overhead of high-resolution imaging infrastructure throughout
3Measurement precision
If high frame rate video data is generated throughout the process, then monitoring precision is improved, but loss of energy increases
Solution Approach 1:
The patent applies periodic action by varying the frame rate according to process stages. During critical processes, high frame rate imaging is activated to ensure monitoring precision, while during non-critical processes, the frame rate is reduced, creating a periodic pattern of high and low energy consumption that overall reduces energy loss while maintaining necessary monitoring precision
Solution Approach 2:
The system changes the frame rate parameter dynamically based on process requirements, transitioning between high and low frame rates to match the criticality of different process stages, thereby achieving energy efficiency without permanently sacrificing monitoring precision
Data Source
AI summary
A monitoring apparatus for a substrate processing apparatus includes: an imaging unit that captures an image of a nozzle of the substrate processing apparatus and a surface of a substrate held by a substrate holder of the substrate processing apparatus; a monitoring data generation unit that generates monitoring video data based on imaging video data captured by the imaging unit during an execution of a substrate process performed by the substrate processing apparatus including a first process and a second process; and a monitoring condition changing unit that changes a generation condition of the monitoring video data during the execution of the substrate process so that at least a resolution or a number of frames of the monitoring video data during an execution of the second process is different from the monitoring video data during an execution of the first process.