Dynamic Seal for Semiconductor Substrate Handling
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Solution Overview
Problem
There is a need for an efficient and contamination-free system and method to move semiconductor substrates while maintaining predefined conditions within a first chamber, as existing systems face challenges in preventing contamination during substrate movement.
Innovation Solution
A dual-chamber system is introduced, where the first chamber maintains predetermined conditions and is isolated from a second chamber using dynamic seals, with a movement system in the second chamber to prevent contamination from entering the first chamber, and pressure control elements to manage pressure levels, ensuring contamination-free substrate handling.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Productivity
If a movement system is introduced to move substrates within the chamber, then substrate handling efficiency is improved, but contamination risk increases
Solution Approach 1:
The chamber is divided into a first chamber for substrate processing and a second chamber for movement system operations. The dynamic seal creates a boundary between these segments, allowing the movement system to operate in the second chamber while the substrate remains in the clean first chamber, thus enabling efficient substrate handling without compromising cleanliness.
Solution Approach 2:
A dynamic seal acts as an intermediary element between the first chamber and the movement system. This seal allows mechanical coupling and movement transmission while maintaining the contamination barrier, enabling the movement system to influence substrate position without direct contact that would cause contamination.
2Object-affected harmful factors
If the chamber is sealed to prevent contamination, then cleanliness is improved, but mechanical movement and coupling become difficult
Solution Approach 1:
The patent employs a dynamic seal instead of a static seal, allowing the seal to adapt and move with the mechanical movements in the chamber. This dynamic sealing mechanism maintains the contamination barrier while accommodating the necessary mechanical movements and couplings between chamber components.
Solution Approach 2:
The dynamic seal serves as an intermediary that transmits mechanical motion while maintaining the sealed environment. It allows force and movement to be transmitted across the seal boundary without compromising the cleanliness of the first chamber, thus enabling ease of operation while maintaining contamination prevention.
3Object-affected harmful factors
If dynamic seals are used to isolate chambers, then contamination is prevented, but system complexity increases
Solution Approach 1:
The movement system is extracted and placed in a separate second chamber, isolated from the first chamber by the dynamic seal. This extraction allows the complex movement mechanisms to be contained in their own chamber, preventing them from complicating the clean first chamber while still enabling necessary substrate handling operations.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The system effectively prevents contamination from reaching the substrate during movement by using dynamic seals and pressure control, maintaining a clean environment within the first chamber for semiconductor manufacturing or inspection processes.
Implementation Method 1
a first dynamic seal formed at the first interface and is arranged to seal the first chamber from the movement system
Implementation Method 2
pressure control elements to manage pressure levels, ensuring contamination-free substrate handling
Data Source
AI summary
According to an embodiment of the invention, there is provided a system, comprising: a first chamber; a second chamber; a chuck; a movement system; wherein the first chamber comprises: a first element that has a first surface; a first chamber housing that comprises a second surface; wherein the first surface and the second surface come into proximity with each other at a first interface; a supporting element for supporting the chuck when the chuck is positioned within the first chamber; and a first dynamic seal formed at the first interface and is arranged to seal the first chamber from the movement system; wherein the second chamber comprises: a second chamber housing; a movement system that is arranged to introduce movement between (a) the first chamber housing and (b) the first element and the chuck; and a movement control element for mechanically coupling the first element to the movement system.