Dynamic Wavefront Control for Frequency Converted Laser Systems

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Solution Overview

Problem

Current frequency converted light sources for semiconductor and photomask inspection systems lack stability and efficiency, particularly in maintaining a consistent wavefront over time due to degradation in optics and nonlinear crystals, which affects the performance and lifespan of deep ultraviolet (DUV) lasers.

Innovation Solution

A laser system incorporating a beam sampling device, diagnostics system, and correction system that samples a portion of the emitted light, measures current wavefront parameters, and provides real-time corrections to maintain a desired wavefront state, using techniques such as moving or adjusting optical elements, changing their temperature, and altering their shape to compensate for degradation.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Power

If frequency conversion is used to generate DUV light, then the laser can operate at higher powers and longer wavelengths, but the wavefront stability degrades over time due to optical element degradation

Engineering Contradiction:
Improvelaser powerVSAvoidwavefront stability
Core Design Contradiction:
PowerVSStability of the object's composition

Solution Approach 1:

The patent implements a feedback control system that continuously monitors wavefront parameters using a beam diagnostics system and automatically adjusts optical elements (lens, mirror, or spatial light modulator) to compensate for wavefront degradation. The system measures current wavefront state, compares it to desired state, and applies corrections through actuators to maintain stable wavefront quality over time despite optical element degradation.

Inventive Principle:
Principle #23Feedback

Solution Approach 2:

The patent introduces dynamic adjustability to the optical system by incorporating movable or reconfigurable optical elements (lens, mirror, or spatial light modulator) that can be real-time adjusted based on measured wavefront conditions. This dynamic capability allows the system to adapt to changing optical conditions and maintain optimal wavefront performance throughout the laser's operational life.

Inventive Principle:
Principle #15Dynamics

2Temperature

If optical elements are used for frequency conversion, then the laser can generate the required wavelength, but the optics and nonlinear crystals degrade over time affecting performance

Engineering Contradiction:
Improveoperating temperature rangeVSAvoidoptical component lifespan
Core Design Contradiction:
TemperatureVSReliability

Solution Approach 1:

The patent applies preliminary correction by proactively monitoring wavefront parameters and applying compensatory adjustments before significant performance degradation occurs. The system continuously measures wavefront quality and applies corrections to optical elements to prevent degradation from affecting inspection system performance, thereby extending the effective operational lifespan of the laser system.

Inventive Principle:
Principle #10Preliminary action

Solution Approach 2:

The feedback control system continuously monitors the impact of optical element degradation on wavefront quality and automatically adjusts optical parameters to compensate for aging effects. This closed-loop control maintains inspection system performance despite the gradual degradation of frequency conversion optics and nonlinear crystals over time.

Inventive Principle:
Principle #23Feedback

3Measurement precision

If a beam sampling device is introduced to monitor wavefront, then wavefront control is enabled, but the system complexity increases

Engineering Contradiction:
Improvewavefront measurement precisionVSAvoidsystem complexity
Core Design Contradiction:
Measurement precisionVSDevice complexity

Solution Approach 1:

The patent extracts a small portion of the laser beam using a beam sampling device (such as a partially transmitting mirror or holographic beam sampler) to create a measurement copy that can be analyzed by the diagnostics system without significantly impacting the main beam quality or intensity. This extraction approach enables wavefront monitoring while minimizing interference with the primary laser function.

Inventive Principle:
Principle #2Taking out (Extraction)

Solution Approach 2:

The patent introduces an intermediary measurement system that indirectly monitors wavefront parameters by analyzing a sampled portion of the beam. The beam diagnostics system acts as an intermediary that measures wavefront properties (such as M-squared ratio or wavefront curvature) without requiring direct interference with the main laser path, thereby enabling monitoring while maintaining system functionality.

Inventive Principle:
Principle #24Intermediary (Mediator)

Applied Scientific Principles

This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.

Function Achieved in This Case

The system ensures stable and long-lasting wavefront output with minimal impact on photocontamination, enhancing the performance and lifespan of frequency converted lasers by continuously monitoring and correcting wavefront changes, thereby improving the throughput and resolution of inspection systems.

Implementation Method 1

The beam sampling device may be a substrate having a first surface, which may be a partially (low) reflecting, light sampling surface

Methodology Applied
Scientific EffectReflection: Reflection

Implementation Method 2

The angle of incidence for the low transmitting mirror may be less than twenty degrees

Methodology Applied
Scientific EffectRefraction: Refraction

Implementation Method 3

the beam diagnostics system being configured for receiving the sampled portion of the emitted light and measuring a current state of a wavefront parameter of the sampled portion of the emitted light

Methodology Applied
Scientific EffectWavefront sensing:

Implementation Method 4

the beam correction system including at least one of: a lens or a mirror element, the beam correction system being configured for: obtaining the measured state from the beam diagnostics system; comparing the measured state of the wavefront parameter against a desired state

Methodology Applied
Scientific EffectOptical path correction:

Implementation Method 5

the lens or mirror element may be moved from a first position to a second position when the correction is provided for obtaining a desired wavefront

Methodology Applied
Scientific EffectFocusing: Focusing

Data Source

PatentUS8686331B2Dynamic wavefront control of a frequency converted laser system
Publication Date: 2014.04.01 KLA CORP
  • US8686331B2 patent drawing
  • US8686331B2 patent drawing
  • US8686331B2 patent drawing

AI summary

The present invention is directed to a laser system in which a current laser wavefront performance of the laser system may be monitored. Further, the laser system embodiments disclosed herein may be configured for correcting the laser wavefront internally via correction system(s) within the laser system. Still further, the correction system(s) disclosed herein may provide a long lifetime of performance and may be configured for having a minimal impact on photocontamination.