Electron Beam Lithography Density Correction for Faster Figure Drawing
Find Innovative SolutionsGenerate Solutions
Solution Overview
Problem
Conventional electron beam lithography techniques are inefficient in determining appropriate emission amounts, especially when dealing with large areas and numerous figures, leading to prolonged processing times.
Innovation Solution
An electron beam lithography apparatus that divides figure regions into smaller areas, calculates and stores density and differential information for each area, and uses this data to determine correction amounts and emission amounts for the electron beam, enabling faster and more accurate figure drawing.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Manufacturing precision
If conventional techniques are used to determine emission amounts, then correction can be applied, but processing time becomes excessively long when dealing with large areas and numerous figures
Solution Approach 1:
The patent divides the figure region into multiple small regions and further segments the calculation process by creating predetermined emission amount information for different density ranges. This segmentation allows parallel processing and avoids calculating all figures sequentially, thereby reducing processing time while maintaining accuracy
Solution Approach 2:
The patent pre-calculates and stores emission amount information for various density ranges before actual figure processing. This preliminary action creates lookup tables that can be quickly referenced during processing, eliminating the need for time-consuming real-time calculations and significantly reducing processing time
2Reliability
If the area influenced by the electron beam is wide and the number of figures is enormous, then comprehensive correction is needed, but the time to determine appropriate emission amounts increases significantly
Solution Approach 1:
The patent applies different emission amount corrections based on local density characteristics of each small region. By determining density-specific emission amounts and applying them locally rather than using a uniform approach, the system achieves comprehensive correction tailored to each area's needs while maintaining high processing speed through the predetermined information lookup mechanism
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The apparatus allows for rapid determination of appropriate emission amounts, significantly reducing processing time when drawing complex figures with electron beams.
Implementation Method 1
an electron beam lithography apparatus including... an emission amount acquisition unit that acquires, for the two or more second small regions, emission amounts of an electron beam
Data Source
AI summary
An electron beam lithography apparatus-includes: a density set storage unit that stores, for each of pieces of figure information, a set of pieces of first density information corresponding to areas occupied by a figure in first small regions divided from a figure region specified by the piece of figure information; a density set acquisition unit that acquires first density sets respectively corresponding to the pieces of figure information from the density set storage unit; a correction amount acquisition unit that acquires correction amounts corresponding to the first density sets for each of the pieces of figure information, and are for the second small regions; an emission amount acquisition unit that acquires, for the second small regions, emission amounts of an electron beam with intensities corresponding to the correction amounts for the second small regions; and a drawing unit that emits an electron beam according to the emission amounts.