Electron Beam Pattern Data Rotation for Boundary Alignment
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Solution Overview
Problem
The electron beam writing process faces challenges in forming precise patterns, particularly with non-smooth boundaries, as the hypotenuse of shapes like right triangles is difficult to create using rectangle beam shots, requiring complex data alignment and reducing process efficiency.
Innovation Solution
The method involves rotating a calculated pattern to align its non-smooth boundary with the beam shots, allowing for the determination of a second set of beam shots to revise the boundary, thereby simplifying the pattern revision process and improving efficiency by reducing the need for individual point corrections.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Manufacturing precision
If rectangle beam shots are used to form a right triangle pattern, then the pattern can be formed by aligning beam shots, but the hypotenuse becomes stepped and non-smooth, requiring complex data alignment and reducing process efficiency
Solution Approach 1:
The patent applies asymmetry by rotating the pattern data so that the hypotenuse boundary becomes parallel to the beam shot grid. This transforms the asymmetric stepped hypotenuse into a symmetric alignment with the rectangular beam shots, eliminating the need for complex individual point corrections and simplifying the data structure while maintaining pattern accuracy
2Manufacturing precision
If rectangle beam shots are used to form a right triangle pattern, then the pattern can be formed by aligning beam shots, but the process efficiency is reduced due to large data requirements
Solution Approach 1:
The patent changes the parameter of pattern orientation by rotating the pattern data. This parameter change transforms the data structure from requiring individual point corrections to a simplified form where the hypotenuse aligns with the beam shot grid, reducing data complexity and improving processing efficiency while maintaining formation accuracy
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This approach simplifies the pattern revision process by aligning the boundary of the desired pattern with the beam shots, reducing data complexity and improving the accuracy of pattern formation on semiconductor wafers or masks.
Implementation Method 1
An electron beam (E-beam) writing process is a process to transform a medium using an electron beam. In particular, some electron beam writing processes use electron beams to write a design (pattern) in a medium.
Data Source
AI summary
A method of pattern data preparation includes the following steps. A desired pattern to be formed on a surface of a layer is inputted. A first set of beam shots are determined, and a first calculated pattern on the surface is calculated from the first set of beam shots. The first calculated pattern is rotated, so that a boundary of the desired pattern corresponding to a non-smooth boundary of the first calculated pattern is parallel to a boundary constituted by beam shots. A second set of beam shots are determined to revise the non-smooth boundary of the first calculated pattern, thereby calculating a second calculated pattern being close to the desired pattern on the surface. The present invention also provides a method of forming a pattern in a layer.