ECPR Chuck Rinsing and Drying Inlets
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Solution Overview
Problem
In electrochemical pattern replication (ECPR) processes, the ECPR chamber, master electrode, and substrate remain wet and contaminated post-plating/etching, leading to oxidation and rendering them unsuitable for reuse or further processing, and the challenge of drying without damaging the components hampers product quality.
Innovation Solution
A chuck assembly with opposing chucks and a fluid/gas tight seal for holding a substrate or master electrode, featuring rinsing and drying inlets and outlets positioned on opposing sides to facilitate efficient rinsing and drying of the ECPR chamber, utilizing a rinsing fluid followed by a drying gas to remove electrolyte and contaminants.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Productivity
If the ECPR chamber, master electrode, and substrate are used for plating/etching processes, then production efficiency is improved, but they remain wet and contaminated making them unsuitable for reuse or further processing
Solution Approach 1:
The patent implements a rinsing and drying system that activates immediately after the plating/etching process. The rinsing fluid is injected through inlets positioned on the chuck, flowing across the interaction surface to remove electrolyte and contaminants before the master electrode and substrate are removed for reuse, preventing oxidation and contamination accumulation
Solution Approach 2:
The system incorporates self-cleaning functionality where the chuck assembly with integrated rinsing inlets and outlets automatically cleans the interaction surface and held substrates/master electrodes after each process cycle, enabling continuous operation without manual intervention for cleaning operations
2Object-affected harmful factors
If rinsing fluid is used to clean the ECPR chamber and components, then oxidation is prevented, but additional processing time is required for rinsing and drying
Solution Approach 1:
The patent combines the rinsing and drying functions into a single integrated system. The rinsing fluid is injected through inlets on the chuck and evacuated through outlets, simultaneously achieving cleaning and preparing the surface for drying without requiring separate handling steps, thus minimizing additional processing time while effectively preventing oxidation
Solution Approach 2:
The system uses hydraulic principles by injecting rinsing fluid through controlled inlets positioned on the chuck surface, creating directed flow across the interaction surface. The fluid is then evacuated through outlets, creating an efficient rinsing cycle that prevents oxidation while maintaining rapid processing speed through controlled fluid dynamics
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This solution enables rapid and efficient rinsing and drying of the ECPR chamber, preventing oxidation and ensuring the chamber, master electrode, and substrate are ready for subsequent processing, improving product quality and enabling reuse of the master electrode.
Implementation Method 1
injecting a flow of a rinsing fluid through at least one inlet on one side of the master electrode and the substrate across the master electrode and the substrate
Implementation Method 2
followed by a drying gas to remove electrolyte and contaminants
Data Source
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AI summary
A chuck for holding a substrate or master electrode in an ECPR process is provided. The chuck comprises an interaction surface (101) for a master electrode or a substrate; and holding means for holding the substrate or master electrode on said interaction surface (101). A chuck surface (102) is positioned circumferentially of the interaction surface (101), and at least one drying or rinsing inlet (103) and at least one drying or rinsing outlet (104) on said chuck surface, said at least one drying or rinsing inlet (103) and the at least one drying or rinsing outlet (104) are positioned on opposing sides of the interaction surface (101) in relation to each other. Assemblies and methods thereof are also provided.