Edge Field Imprint Lithography Template Protection
Find Innovative SolutionsGenerate Solutions
Solution Overview
Problem
In nano-fabrication, especially during partial field imprinting, contact between the imprint lithography template and the substrate at the edge fields can lead to partial field defect transfer and high alignment control forces, resulting in mis-patterning and non-recoverable template damage due to frictional forces and potential contamination.
Innovation Solution
The use of an edge step layer with a sloped profile and fluid control features on the substrate prevents contact between the imprint lithography template and the substrate at the edge fields by creating a gap, minimizing bending-induced contact and controlling the polymerizable material distribution to prevent template damage and misalignment.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Manufacturing precision
If the imprint lithography template contacts the substrate at edge fields during partial field imprinting, then the patterning process can be completed, but partial field defect transfer and high alignment control forces occur resulting in mis-patterning and template damage
Solution Approach 1:
A release layer is introduced between the imprint lithography template and the substrate at edge fields. This intermediary layer prevents direct contact and frictional forces during the imprinting process, eliminating the source of template damage and defect transfer while allowing the patterning process to proceed successfully.
Solution Approach 2:
The substrate surface is segmented into different regions: a first region at the edge fields where the release layer is applied to prevent contact, and a second region in the interior where no release layer is present allowing normal adhesion. This segmentation allows selective contact control across different areas of the substrate.
2Productivity
If the imprint lithography template contacts the substrate at edge fields, then the imprinting process can proceed, but frictional forces cause high alignment control forces and mis-patterning
Solution Approach 1:
The release layer acts as a mediator that reduces frictional forces between the template and substrate at edge fields during the imprinting process. This reduction in friction directly decreases the alignment control forces required, making the process easier to control while maintaining productivity.
3Manufacturing precision
If the template contacts the substrate at edge fields during imprinting, then the patterning can be completed, but contamination and non-recoverable template damage occur
Solution Approach 1:
The release layer serves as a protective intermediary that prevents direct contact between the template and substrate at edge fields, thereby eliminating the mechanism for contamination and non-recoverable template damage while allowing pattern formation to proceed in the interior regions.
Solution Approach 2:
The release layer is applied in advance to the substrate at edge fields before the imprinting process begins. This preliminary action prepares the surface to prevent contact and contamination before the template is brought into contact with the substrate during patterning.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This approach effectively prevents partial field defect transfer and reduces alignment control forces, enhancing overlay performance and maintaining template integrity by maintaining a controlled distance and preventing direct contact between the template and substrate at the edge fields.
Implementation Method 1
contacting the polymerizable material at one or more of a plurality of edge fields located at a perimeter of the substrate with the mold of the imprint lithography template; and based on the contacting, forming a pattern based on the patterned features
Data Source
AI summary
Methods, systems, and apparatus, including computer programs encoded on a computer storage medium, for an imprint lithography method of edge field patterning, the method including providing a template having a mold, the mold having a patterning surface comprising patterned features; providing a substrate having an edge step layer positioned thereon the edge step layer including a sloped profile; depositing a polymerizable material on the edge step layer of the substrate; contacting the polymerizable material at one or more of a plurality of edge fields located at a perimeter of the substrate with the mold of the template; and based on the contacting, forming a pattern based on the patterned features at the one or more edge fields to provide an edge field pattern, wherein contact between the template and the substrate proximate to the plurality of edge fields is prevented based on the edge step layer of the substrate.