Movable Edge Ring Coupling for Plasma Density Control

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Solution Overview

Problem

Existing plasma processing apparatuses face challenges in efficiently controlling the plasma density and maintaining electrical coupling between the edge ring and the base, leading to inconsistencies in plasma processing results.

Innovation Solution

The apparatus incorporates a lifter mechanism with a conductive ring and a connector that maintains electrical coupling between the edge ring and the base, allowing for controlled movement and adjustment of the edge ring to manage plasma density, using a switchable configuration to alter conductivity states based on processing requirements.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Quantity of substance

If the edge ring is raised and lowered to control plasma density, then plasma density control is improved, but electrical coupling between the edge ring and base becomes unstable

Engineering Contradiction:
Improveplasma densityVSAvoidelectrical coupling stability
Core Design Contradiction:
Quantity of substanceVSReliability

Solution Approach 1:

A conductive rod is introduced as an intermediary component between the edge ring and the base. This rod maintains continuous electrical coupling even when the edge ring moves vertically, solving the problem of unstable electrical coupling while allowing plasma density control through edge ring position adjustment.

Inventive Principle:
Principle #24Intermediary (Mediator)

Solution Approach 2:

The system transitions from a static electrical coupling structure to a dynamic one where the conductive rod can accommodate vertical movement of the edge ring. The rod's ability to move with the edge ring while maintaining electrical contact enables dynamic plasma density control without sacrificing coupling stability.

Inventive Principle:
Principle #15Dynamics

2Manufacturing precision

If the edge ring position is adjusted to improve processing uniformity, then manufacturing precision is improved, but device complexity increases

Engineering Contradiction:
Improveprocessing uniformityVSAvoidlifter mechanism complexity
Core Design Contradiction:
Manufacturing precisionVSDevice complexity

Solution Approach 1:

The conductive rod serves multiple functions: it maintains electrical coupling between the edge ring and base, provides a mechanical connection for the lifter mechanism, and accommodates vertical movement. This multi-functionality reduces the need for additional separate components, thereby limiting the increase in device complexity while enabling edge ring position adjustment for improved processing uniformity.

Inventive Principle:
Principle #6Universality (Multi-functionality)

3Reliability

If the connector maintains electrical coupling during edge ring movement, then reliability is improved, but the connector design becomes more complex

Engineering Contradiction:
Improveelectrical coupling maintenanceVSAvoidconnector structure
Core Design Contradiction:
ReliabilityVSDevice complexity

Solution Approach 1:

The conductive rod acts as an intermediary connector that simplifies the electrical coupling maintenance problem. Instead of using a complex flexible or sliding contact mechanism, the rod provides a straightforward mechanical and electrical connection that naturally accommodates edge ring movement, improving reliability without excessive complexity.

Inventive Principle:
Principle #24Intermediary (Mediator)

Applied Scientific Principles

This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.

Function Achieved in This Case

This solution enables precise control over plasma density and uniform processing results by maintaining consistent electrical coupling, enhancing the quality and consistency of plasma processing on substrates.

Implementation Method 1

an electrostatic chuck on the base

Methodology Applied
Scientific EffectElectrostatic attraction: Electrostatics

Implementation Method 2

The bias power supply generates an electrical bias to draw ions from the plasma into the substrate on the substrate support

Methodology Applied
Scientific EffectIon attraction by electrical bias: Electrostatics

Implementation Method 3

The plasma generator includes a radio-frequency power supply. The plasma generator generates plasma in the chamber

Methodology Applied
Scientific EffectRadio-frequency plasma generation: Plasma

Data Source

PatentUS20250210330A1Plasma processing apparatus and substrate processing system
Publication Date: 2025.06.26 TOKYO ELECTRON LTD
  • US20250210330A1 patent drawing
  • US20250210330A1 patent drawing
  • US20250210330A1 patent drawing

AI summary

A plasma processing apparatus includes a chamber, a substrate support, an edge ring, a lifter, a plasma generator, and a bias power supply. The substrate support is in the chamber. The lifter raises and lowers the edge ring relative to the substrate support. The substrate support includes a base electrically coupled to at least one of the bias power supply or a radio-frequency power supply in a plasma generator, and an electrostatic chuck on the base. The lifter includes a conductive ring and a connector. The conductive ring is electrically coupled to the edge ring while supporting the edge ring placed on the conductive ring. The connector maintains electrical coupling between the conductive ring and the base for movement of the edge ring and the conductive ring with the lifter.