Edge Ring Protrusion Structure for Uniform Purge Gas Flow

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Solution Overview

Problem

Existing substrate processing methods fail to ensure uniform supply of purge gas and precise positioning of substrates during deposition processes, leading to inefficiencies in deposition layer formation and yield.

Innovation Solution

An edge ring with a ring body and protrusions is used, allowing for uniform purge gas supply and precise substrate positioning by creating a gap for gas flow even when the substrate is eccentrically placed, ensuring effective deposition processes.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Manufacturing precision

If a conventional edge ring without protrusions is used, then the structure is simple, but the purge gas cannot be uniformly supplied and substrate positioning is imprecise

Engineering Contradiction:
Improvesubstrate positioning precisionVSAvoidedge ring structure complexity
Core Design Contradiction:
Manufacturing precisionVSDevice complexity

Solution Approach 1:

The edge ring's inner side surface is segmented into multiple regions by providing protrusions that extend from the inner circumference toward the center. These protrusions divide the space between the edge ring and substrate into multiple channels, enabling uniform purge gas distribution while maintaining a relatively simple overall ring structure.

Inventive Principle:
Principle #1Segmentation

Solution Approach 2:

Protrusions are strategically positioned at specific locations on the inner side surface of the edge ring, creating localized structures that serve specific functions: guiding substrate positioning at certain points while allowing purge gas flow channels in between. This local modification achieves improved precision without requiring complete structural redesign.

Inventive Principle:
Principle #3Local quality

2Manufacturing precision

If the edge ring has a uniform inner circumference, then the structure is simple to manufacture, but the purge gas flow is not uniform across different regions

Engineering Contradiction:
Improvepurge gas supply uniformityVSAvoidedge ring manufacturing complexity
Core Design Contradiction:
Manufacturing precisionVSEase of manufacture

Solution Approach 1:

The uniformly simple inner circumference is segmented by adding protrusions that create multiple flow channels. These protrusions are distributed around the circumference to divide the purge gas flow path into several segments, ensuring uniform gas distribution to different regions of the substrate without requiring complex non-uniform shaping of the entire ring.

Inventive Principle:
Principle #1Segmentation

Solution Approach 2:

Instead of modifying the inner circumference in the radial dimension (which would create manufacturing complexity), the invention adds protrusions in the axial dimension (extending toward the substrate from the inner surface). This dimensional approach creates flow channel segmentation while maintaining the simplicity of the ring's overall cylindrical shape and inner circumference.

Inventive Principle:
Principle #17Another dimension (Dimensionality change)

3Manufacturing precision

If no protrusions are provided on the edge ring, then the manufacturing process is simple, but the deposition layer thickness cannot be precisely controlled

Engineering Contradiction:
Improvedeposition layer thickness controlVSAvoidedge ring structure
Core Design Contradiction:
Manufacturing precisionVSDevice complexity

Solution Approach 1:

The protrusions segment the deposition space into multiple zones with controlled geometry. By defining specific gap distances between protrusions and the substrate, each zone achieves uniform deposition characteristics, enabling precise control of deposition layer thickness across the entire substrate surface.

Inventive Principle:
Principle #1Segmentation

Solution Approach 2:

The protrusions create localized regions with specific geometric properties that control deposition uniformity. Each protrusion defines a local deposition zone with controlled gap distance, allowing precise thickness control in each region while the overall edge ring structure remains relatively simple.

Inventive Principle:
Principle #3Local quality

Data Source

PatentUS20240093368A1Edge ring, substrate processing apparatus including the same, and substrate processing method using the same
Publication Date: 2024.03.21 SAMSUNG ELECTRONICS CO LTD
  • US20240093368A1 patent drawing
  • US20240093368A1 patent drawing
  • US20240093368A1 patent drawing

AI summary

An edge ring includes a ring body having an axis parallel to a first direction; and a plurality of protrusions provided at an inner side surface of the ring body and protruding toward the axis, the plurality of protrusions being spaced apart from each other in a circumference direction of the edge ring, wherein a first distance between the axis and a first point on the inner side surface of the ring body between two adjacent protrusions of the plurality of protrusions is larger than a second distance between the axis and a second point on the inner side surface of the ring body at which a protrusion of the plurality of protrusions is provided.