Edge Ring Segmented Channel for Localized Tuning Gas Delivery
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Solution Overview
Problem
Current substrate processing systems face challenges in achieving localized delivery of tuning gases, leading to diffusion-related process impacts across the entire wafer and sensitivity to wafer gap, which affects edge radial uniformity and cleaning efficiency.
Innovation Solution
An edge ring with an annular channel partitioned into distinct sections and injection ports for localized delivery of gases directly to the wafer edge, reducing diffusion length and allowing for controlled gas flow to address edge radial uniformity and cleaning efficiency.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Manufacturing precision
If tuning gas is delivered through conventional gas distribution systems, then gas can be supplied to the processing chamber, but the gas diffuses across the entire wafer surface causing non-uniform edge radial distribution and reduced cleaning efficiency
Solution Approach 1:
The annular channel is divided into multiple distinct sections (N sections) separated by partitioning blocks, allowing independent gas injection at different azimuthal positions. This segmentation enables localized gas delivery to specific regions of the wafer edge, improving radial uniformity by preventing gas diffusion across the entire wafer surface.
Solution Approach 2:
The edge ring provides localized gas delivery directly at the wafer edge through radially inward extending slits in the flange. This local quality approach ensures gas is supplied precisely where needed (at the wafer periphery) rather than distributing it uniformly across the entire wafer surface, thereby improving edge radial uniformity and cleaning efficiency.
2Reliability
If gas is delivered from conventional distribution systems, then gas flow can be maintained, but the system is sensitive to wafer gap variations affecting process consistency
Solution Approach 1:
The edge ring structure pre-positioned at the substrate support assembly creates a fixed gas delivery geometry relative to the wafer edge. This preliminary positioning ensures that gas is delivered at a consistent radial location regardless of wafer gap variations, reducing sensitivity to gap changes and improving process consistency.
3Productivity
If conventional gas delivery methods are used, then gas can reach the wafer surface, but diffusion length is too long causing loss of gas control and reduced cleaning efficiency
Solution Approach 1:
The gas delivery system extracts the gas distribution function from the conventional overhead showerhead and relocates it to the edge ring at the substrate support assembly. This extraction shortens the diffusion path by delivering gas directly at the wafer edge rather than from above, reducing diffusion length and improving cleaning efficiency through better gas control.
4Manufacturing precision
If uniform gas distribution is provided across the wafer, then overall gas coverage is achieved, but edge radial uniformity cannot be independently controlled
Solution Approach 1:
The annular channel is divided into multiple distinct sections (N sections) separated by partitioning blocks, allowing independent gas injection at different azimuthal positions. This segmentation enables localized gas delivery to specific regions of the wafer edge, improving radial uniformity by preventing gas diffusion across the entire wafer surface.
Solution Approach 2:
The edge ring provides localized gas delivery directly at the wafer edge through radially inward extending slits in the flange. This local quality approach ensures gas is supplied precisely where needed (at the wafer periphery) rather than distributing it uniformly across the entire wafer surface, thereby improving edge radial uniformity and cleaning efficiency.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The localized delivery of tuning gases improves edge radial uniformity and cleaning efficiency by reducing diffusion length and minimizing impact on the upper electrode, enabling precise control over gas distribution and deposition.
Implementation Method 1
reducing diffusion length and allowing for controlled gas flow to address edge radial uniformity and cleaning efficiency
Implementation Method 2
A plurality of slits is arranged in the flange. The slits are in fluid communication with the annular channel and extend radially inwards from the annular channel to deliver the one or more gases.
Data Source
AI summary
An edge ring for a substrate processing system includes an annular body and an annular channel disposed in the annular body circumferentially along an inner diameter of the annular body. The annular channel includes N distinct sections, where N is an integer greater than 1. The edge ring includes N injection ports arranged circumferentially on the annular body to respectively inject one or more gases into the N distinct sections of the annular channel. The edge ring includes a flange extending radially inwards from the inner diameter of the annular body. A plurality of slits is arranged in the flange. The slits are in fluid communication with the annular channel and extend radially inwards from the annular channel to deliver the one or more gases.