Edge Ring Electrode Layout for Stable Sheath Positioning
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Solution Overview
Problem
Existing substrate processing apparatuses face challenges in stably applying voltage to the edge ring, which affects the consistency and efficiency of plasma processing.
Innovation Solution
A substrate support is designed with a conductive electrode formed on the edge ring mounting surface, allowing for stable voltage application to the edge ring, and an electrostatic chuck is used to attract and hold the edge ring in place.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Reliability
If a DC voltage is applied to the focus ring to adjust the sheath position, then the sheath position can be controlled, but the voltage application becomes unstable
Solution Approach 1:
The electrode is divided into multiple segments: a first electrode on the inner surface of the edge ring and a second electrode on the outer surface of the edge ring. This segmentation allows independent voltage application to different surfaces, enabling stable and flexible voltage control for sheath position adjustment.
Solution Approach 2:
The edge ring acts as an intermediary component between the electrodes and the sheath. By placing electrodes on both the inner and outer surfaces of the edge ring, the system can apply voltage through the edge ring to stabilize the sheath position more effectively.
2Manufacturing precision
If voltage is applied to the edge ring, then the sheath position can be adjusted, but the edge ring may deform or shift
Solution Approach 1:
Electrodes are placed at specific locations on the edge ring (inner and outer surfaces) rather than uniformly across the entire edge ring. This localized electrode placement allows voltage to be applied precisely where needed to control sheath position without causing unnecessary stress or deformation to the edge ring structure.
Solution Approach 2:
The system allows dynamic adjustment of voltage applied to different electrode surfaces based on processing requirements. By independently controlling the voltage on the inner and outer electrodes, the system can adaptively maintain edge ring stability while achieving precise sheath position control.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This configuration ensures stable and reproducible power feeding to the edge ring, maintaining the position of the sheath and preventing deformation or shifting, thereby enhancing the overall efficiency and consistency of plasma processing.
Implementation Method 1
a conductive electrode formed on the edge ring mounting surface and configured to provide a voltage to the edge ring
Implementation Method 2
an electrostatic chuck is used to attract and hold the edge ring in place
Data Source
AI summary
Provided is a technique for stably applying a voltage to an edge ring. Provided is a substrate support including: a substrate mounting surface on which a substrate is mounted; an edge ring mounting surface on which an edge ring is mounted around the substrate mounting surface; and a conductive electrode formed on the edge ring mounting surface and configured to apply a voltage to the edge ring.