Edge Ring Wear Detection Using Pulse Electrode Voltage

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Solution Overview

Problem

Existing methods fail to accurately determine the wear of edge rings in plasma processing apparatuses, which can affect the performance and consistency of plasma processing.

Innovation Solution

A method involving cyclically applying a pulse of voltage to electrodes in a plasma processing apparatus to measure the wear of an edge ring by analyzing the voltage values of a first and second electrode, allowing for precise determination of wear based on predefined relationships between voltage ratios and wear rates or thickness.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Measurement precision

If conventional methods are used to determine edge ring wear, then the measurement process is simple, but the measurement precision is insufficient

Engineering Contradiction:
Improvewear measurement accuracyVSAvoidmeasurement system complexity
Core Design Contradiction:
Measurement precisionVSDevice complexity

Solution Approach 1:

The patent replaces physical contact-based wear measurement methods with a voltage-based electrical measurement system. By measuring voltage changes on the edge ring during plasma processing, the system determines wear amount without mechanical contact, thereby improving measurement precision while avoiding complex mechanical measurement devices

Inventive Principle:
Principle #28Mechanics substitution (Replace mechanical system)

Solution Approach 2:

The patent introduces voltage as an intermediary parameter to indirectly measure edge ring wear. Instead of directly measuring physical wear dimensions, the system measures voltage changes that correlate with wear, providing accurate wear determination through an intermediate electrical property

Inventive Principle:
Principle #24Intermediary (Mediator)

2Measurement precision

If real-time voltage monitoring is implemented during plasma generation, then wear determination accuracy improves, but the energy consumption increases

Engineering Contradiction:
Improvewear determination accuracyVSAvoidenergy consumption during measurement
Core Design Contradiction:
Measurement precisionVSUse of energy by moving object

Solution Approach 1:

The patent makes the voltage measurement system multi-functional by utilizing the existing voltage applied during plasma generation for both plasma maintenance and wear measurement purposes. The same voltage source serves dual functions, eliminating the need for separate measurement energy input

Inventive Principle:
Principle #6Universality (Multi-functionality)

Solution Approach 2:

The system uses its own operating voltage for wear measurement purposes. The voltage already applied to maintain plasma generation simultaneously provides the measurement signal, allowing the system to self-monitor wear without external energy input or additional measurement systems

Inventive Principle:
Principle #25Self-service

Applied Scientific Principles

This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.

Function Achieved in This Case

Enables accurate monitoring and management of edge ring wear, ensuring consistent plasma processing performance by adjusting parameters or replacing the edge ring when necessary, thereby maintaining process quality.

Implementation Method 1

generating plasma in a chamber in a plasma processing apparatus

Methodology Applied
Scientific EffectPlasma generation: Plasma

Implementation Method 2

cyclically applying, to draw ions from the plasma to the substrate support, a pulse of a voltage to the first electrode and the second electrode

Methodology Applied
Scientific EffectIon movement: Ion Repulsion/Attraction

Data Source

PatentUS12609277B2Method for determining amount of wear of edge ring, plasma processing apparatus, and substrate processing system
Publication Date: 2026.04.21 TOKYO ELECTRON LTD
  • US12609277B2 patent drawing
  • US12609277B2 patent drawing
  • US12609277B2 patent drawing

AI summary

A method includes (a) generating plasma in a chamber in a plasma processing apparatus. The plasma processing apparatus includes a substrate support in the chamber. The substrate support includes a first portion to support a substrate and a second portion to support an edge ring. The first portion includes a first electrode, and the second portion includes a second electrode. The method further includes (b) cyclically applying, to draw ions from the plasma to the substrate support, a pulse of a voltage to the first electrode and the second electrode. The method further includes (c) determining an amount of wear of the edge ring based on a first voltage value of the first electrode and a second voltage value of the second electrode measured when the pulse of the voltage is applied to the first electrode and the second electrode.