EFEM Transfer Robot Venting for Wafer Particle Control
Find Innovative SolutionsGenerate Solutions
Solution Overview
Problem
Conventional transfer robots in equipment front end modules (EFEMs) face contamination issues due to particle dispersion during the raising and lowering operations, which compromises the cleanliness of semiconductor wafers.
Innovation Solution
The transfer robot design incorporates a base unit with a vent part that introduces and exhausts clean air downflow to minimize turbulence and particle dispersion, featuring a wide vent part and exhaust system to maintain a clean environment, and includes a lifting unit that is raisable and lowerable along a vertical shaft to support the arm unit.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Ease of operation
If a lifting unit is raised and lowered by protruding from a base unit, then the transfer robot can perform substrate transfer operations, but particles are dispersed from the inside of the base unit contaminating the substrate
Solution Approach 1:
A cover member with an opening is provided on the base unit, and a flexible bellows structure is installed at the opening. The bellows expands and contracts to accommodate the lifting unit's movement while maintaining a sealed environment that prevents particle dispersion. This flexible membrane structure allows vertical motion while containing particles inside the base unit.
Solution Approach 2:
The bellows structure acts as an intermediary element between the lifting unit and the external environment. It mediates the mechanical movement of the lifting unit while preventing direct communication between the internal base unit environment and the external cleanroom environment, thus blocking particle escape.
2Adaptability or versatility
If the lifting unit is raised and lowered, then the arm unit can reach different positions for transfer, but turbulence is generated dispersing particles
Solution Approach 1:
The bellows structure provides a flexible sealed connection that moves with the lifting unit, preventing turbulence at the opening. By maintaining a continuous seal during vertical movement, the bellows eliminates the turbulence that would otherwise occur at an open or poorly sealed interface, thus preventing particle dispersion while allowing full range of motion.
3Object-affected harmful factors
If a cover member is provided to prevent particle adhesion, then substrate contamination is reduced, but the structure becomes more complex
Solution Approach 1:
The bellows structure integrates the sealing function directly into the existing base unit opening without requiring additional rigid cover members or complex mechanical assemblies. This flexible membrane solution simplifies the overall structure while effectively preventing particle adhesion to the substrate.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This design effectively suppresses particle generation and contamination during the raising and lowering operations, maintaining a clean environment within the EFEM and ensuring the cleanliness of semiconductor wafers.
Implementation Method 1
vents downflow from an outside to an inside of the base unit
Data Source
AI summary
A transfer robot according to the embodiment includes an arm unit, a base unit, a guide unit, a lifting unit, and a vent part. The arm unit includes a robot hand capable of holding an object to be transferred. The base unit is formed into a substantially box shape. The guide unit includes a vertical shaft vertically arranged in the base unit. The lifting unit is provided to be raisable and lowerable along the vertical shaft and supports the arm unit at an upper end portion. The vent part is opened in an upper surface of the base unit and vents downflow from an outside to an inside of the base unit.