Integrated Controller for Semiconductor Effluent Plasma Treatment

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Solution Overview

Problem

Current semiconductor processing equipment controllers, such as PLCs, have limited functionality and complexity in controlling the treatment of hazardous effluents like PFCs and particulate matter, making it difficult to manage the treatment process effectively and efficiently.

Innovation Solution

A controller system that includes a plasma reactor, mass flow controllers, pressure regulating modules, and advanced programming capabilities to manage the treatment of semiconductor processing effluents, allowing for more precise control and error reporting, with features like programmable sequences and real-time monitoring.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Extent of automation

If PLCs are used for controlling treatment technology, then the treatment process can be automated, but the control functionality is limited and the system complexity increases due to required hardware adaptations and external logic

Engineering Contradiction:
Improveautomation of treatment processVSAvoidsystem complexity
Core Design Contradiction:
Extent of automationVSDevice complexity

Solution Approach 1:

The controller is designed to perform multiple functions including process control, data logging, error reporting, and system interface operations within a single integrated device. This eliminates the need for separate hardware adaptations and external logic components that would be required with traditional PLCs, thereby reducing overall system complexity while maintaining comprehensive automation capabilities.

Inventive Principle:
Principle #6Universality (Multi-functionality)

2Loss of information

If traditional PLCs are used for error reporting and data logging, then the system can monitor treatment processes, but programming is limited and may be infeasible due to the nature of current PLC designs

Engineering Contradiction:
Improveerror reporting and data logging capabilityVSAvoidprogramming complexity
Core Design Contradiction:
Loss of informationVSDevice complexity

Solution Approach 1:

The controller includes built-in self-service capabilities for error reporting and data logging that do not require complex external programming. The system automatically monitors treatment processes, logs data, and generates error reports using integrated software functions, eliminating the need for sophisticated PLC programming that is often infeasible with traditional designs.

Inventive Principle:
Principle #25Self-service

3Reliability

If more complex abatement technology is used to treat hazardous compounds, then treatment effectiveness improves, but control complexity increases

Engineering Contradiction:
Improvetreatment effectivenessVSAvoidcontrol complexity
Core Design Contradiction:
ReliabilityVSDevice complexity

Solution Approach 1:

The controller merges multiple control functions for complex abatement technology into a single integrated unit. By combining process control, monitoring, data logging, and error reporting in one device with unified software, the system maintains high treatment effectiveness while reducing control complexity compared to using separate systems for each function.

Inventive Principle:
Principle #5Merging (Combining)

Applied Scientific Principles

This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.

Function Achieved in This Case

Enhances the efficiency and control of the treatment process, enabling the conversion of hazardous compounds into less hazardous forms, improving environmental and safety outcomes by providing a more sophisticated and flexible control system for semiconductor processing equipment.

Implementation Method 1

An inductively coupled plasma (ICP) source, along with other reagents, has been used for the treatment of PFCs and other global warming gases. The plasma generated by the ICP plasma source dissociates these compounds, and the dissociated gases react to form less hazardous materials.

Methodology Applied
Scientific EffectPlasma: Plasma

Implementation Method 2

An inductively coupled plasma (ICP) source, along with other reagents, has been used for the treatment of PFCs and other global warming gases.

Methodology Applied
Scientific EffectInductive coupling: Electromagnetic Induction

Data Source

PatentUS10564609B2Controller for treatment of semiconductor processing equipment effluent
Publication Date: 2020.02.18 APPLIED MATERIALS INC
  • US10564609B2 patent drawing
  • US10564609B2 patent drawing
  • US10564609B2 patent drawing

AI summary

Embodiments disclosed herein include a controller for a treatment system for lessening the hazard of effluents produced in a processing system.