Liquid Ejection Head Gas Barrier Layer Contamination Control
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Solution Overview
Problem
The existing methods for manufacturing ink jet recording heads face inefficiencies due to contamination of the exposure apparatus and masks by decomposed matter from photodegradable resins, leading to reduced production efficiency and frequent mask washing.
Innovation Solution
A method involving a first photosensitive resin layer with a gas barrier layer of high film density (1 g/cm3 or more) is used to prevent contamination by blocking decomposed matter, followed by pattern exposure and development to form the mold material and ejection ports, allowing for reduced mask washing and improved production efficiency.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Ease of manufacture
If a photodegradable positive photosensitive resin layer is used as mold material for ink channel formation, then the resin can be easily laminated on the supply port and has good coating properties, but decomposed matter from the resin contaminates the exposure apparatus and masks during exposure, requiring frequent mask washing and reducing production efficiency
Solution Approach 1:
A gas barrier layer is introduced as an intermediary between the photodegradable positive photosensitive resin layer and the exposure apparatus. This barrier layer prevents decomposed matter from the resin from contaminating the exposure apparatus and masks during exposure, thereby eliminating the need for frequent mask washing and improving production efficiency while maintaining the ease of manufacture of the resin coating
2Manufacturing precision
If the film thickness of the positive photosensitive resin layer is increased to exceed 15 μm to serve as adequate mold material for the ink channel, then sufficient mold material is provided, but the energy required for exposure increases and decomposition of the photodegradable resist becomes significant, generating contaminating gases
Solution Approach 1:
The gas barrier layer serves as a protective intermediary that allows the use of thicker photodegradable positive photosensitive resin layers (exceeding 15 μm) as adequate mold material without the harmful side effect of decomposed matter contaminating the exposure apparatus. The barrier layer blocks the decomposed matter while permitting the necessary exposure energy to reach the resin layer
3Reliability
If frequent mask washing is performed to remove decomposed matter from the exposure apparatus, then contamination is reduced and patterning properties are maintained, but production efficiency sharply decreases due to the washing interruptions
Solution Approach 1:
The gas barrier layer acts as a permanent protective intermediary that prevents decomposed matter from reaching the masks during exposure. This eliminates the need for frequent mask washing operations, thereby maintaining reliable patterning properties while continuously improving production efficiency by removing washing interruptions from the manufacturing process
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The method effectively prevents contamination of the exposure apparatus and masks, reducing the need for frequent washing and enhancing production efficiency by using a gas barrier layer to block decomposed matter from the photodegradable resin.
Implementation Method 1
providing a gas barrier layer having a film density of 1 g/cm3 or more on the first photosensitive resin layer
Implementation Method 2
a first photosensitive resin layer containing a photodegradable positive photosensitive resin
Data Source
AI summary
A method of manufacturing a liquid ejection head, and the method includes a process of providing a first photosensitive resin layer containing a photodegradable positive photosensitive resin and serving as a mold material of the channel on a substrate, a process of providing a gas barrier layer having a film density of 1 g/cm3 or more on the first photosensitive resin layer, a process of subjecting the first photosensitive resin layer and the gas barrier layer to pattern exposure, and then performing development to thereby form the mold material of a channel and also removing the gas barrier layer before or simultaneously with the development, a process of providing a second photosensitive resin layer on the mold material and the substrate, a process of subjecting the second photosensitive resin layer to pattern exposure, and then performing development, and a process of removing the mold material of the channel.