Elastic-Top Lamination Chuck for Smoother Semiconductor Packaging
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Solution Overview
Problem
The integration of multiple semiconductor devices into compact, high-performance packages poses challenges in miniaturization and electrical performance, particularly in achieving lower transmission and insertion losses, which existing packaging and assembling techniques have not adequately addressed.
Innovation Solution
A lamination chuck with a soft, elastic polymeric top layer and a rigid support layer, featuring vacuum channels for precise film material handling and lamination, ensures smooth surface quality and efficient integration of semiconductor packages by applying controlled suction and pressure during the lamination process.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Loss of energy
If traditional packaging and assembling techniques are used, then manufacturing simplicity is maintained, but transmission loss and insertion loss cannot be sufficiently reduced
Solution Approach 1:
The patent segments the semiconductor device structure into multiple functional layers including substrate, device layers, and encapsulant layers. Each layer is separately manufactured and then laminated together, allowing optimization of each layer's properties to reduce transmission and insertion losses while maintaining manageable manufacturing complexity
Solution Approach 2:
The patent employs composite material structures combining different dielectric materials, conductive layers, and encapsulant materials with optimized properties. This composite approach enables tailored electromagnetic performance to reduce losses while the modular lamination process keeps manufacturing feasible
2Volume of moving object
If semiconductor devices are miniaturized to meet increasing demand, then higher integration is achieved, but surface irregularities and manufacturing precision challenges increase
Solution Approach 1:
The patent applies local quality optimization by using a compliant encapsulant material that specifically targets and fills surface irregularities in localized areas. The encapsulant's modified rheological properties enable it to flow into and smooth over uneven surfaces beneath, achieving local surface correction without requiring complete re-manufacturing of the entire device
Solution Approach 2:
The patent changes the rheological parameters of the encapsulant material, specifically adjusting viscosity and flow characteristics, to enable the material to effectively fill and smooth surface irregularities. This parameter modification allows the encapsulant to adapt to varying surface conditions while maintaining miniaturization benefits
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This solution enables the production of semiconductor packages with improved surface smoothness and reduced irregularities, enhancing electrical performance and miniaturization capabilities while maintaining cost-effectiveness and yield.
Implementation Method 1
A lamination chuck with a soft, elastic polymeric top layer and a rigid support layer, featuring vacuum channels for precise film material handling and lamination, ensures smooth surface quality and efficient integration of semiconductor packages by applying controlled suction and pressure during the lamination process.
Implementation Method 2
The top layer includes a polymeric material having a Shore A hardness lower than a Shore hardness of a material of the support layer
Data Source
AI summary
A lamination chuck for lamination of film materials includes a support layer and a top layer. The top layer is disposed on the support layer. The top layer includes a polymeric material having a Shore A hardness lower than a Shore hardness of a material of the support layer. The top layer and the support layer have at least one vacuum channel formed therethrough, vertically extending from a top surface of the top layer to a bottom surface of the support layer.


