Elastic Hinge Reticle Stage for Nanometer Precision
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Solution Overview
Problem
High-precision alignment in semiconductor device manufacturing is hindered by deformation of the reticle stage due to acceleration/deceleration forces, which affects the accuracy of transferring reticle patterns onto silicon wafers, requiring a solution to suppress deformation and maintain position reproducibility at the nanometer level.
Innovation Solution
A stage apparatus with a reticle holding unit that includes a first portion and a second portion connected via elastic hinges, allowing the second portion to absorb and reduce deformation forces transmitted from the fine moving stage, thereby minimizing deformation of the reticle held by the stage.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Speed
If the fine moving stage is accelerated/decelerated to move the reticle stage, then the stage can change position quickly, but the stage deforms and transmits deformation force to the reticle, reducing alignment precision
Solution Approach 1:
The patent introduces an elastic hinge as an intermediary component between the fine moving stage and the reticle holding unit. This elastic hinge acts as a mediator that absorbs and reduces deformation forces transmitted from the accelerating/decelerating stage, preventing direct transmission of deformation to the reticle while still allowing the stage to move at high speed. The elastic hinge converts rigid deformation transmission into elastic deformation absorption, resolving the contradiction between speed and precision.
2Force
If the fine moving stage is pulled by large force to accelerate/decelerate quickly, then the stage can achieve high acceleration, but the reticle holding unit deforms, making high-precision alignment impossible
Solution Approach 1:
The elastic hinge in the reticle holding unit serves as a pre-positioned cushioning element that anticipates and absorbs deformation forces before they can reach the reticle. By incorporating this elastic deformation absorption mechanism in advance, the system can withstand large acceleration forces without transmitting harmful deformation to the reticle, thus maintaining position reproducibility at the nanometer level even during high-force acceleration phases.
3Device complexity
If the reticle holding unit is rigidly connected to the fine moving stage, then the structure is simple, but deformation of the stage is directly transmitted to the reticle, reducing alignment precision
Solution Approach 1:
The patent changes the mechanical parameter of the connection between the fine moving stage and the reticle holding unit from rigid (infinite stiffness) to elastic (finite, controllable stiffness). By using an elastic hinge with specific elasticity characteristics, the system transforms the binary rigid connection into a controlled elastic connection that can deform to absorb stage movements while maintaining reticle stability. This parameter change enables the system to achieve both structural simplicity and high alignment precision.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The elastic hinges effectively reduce reticle deformation by up to 1/10 of the original deformation, ensuring high-precision alignment and position reproducibility, enhancing the accuracy of pattern transfer and maintaining high throughput in semiconductor device manufacturing.
Implementation Method 1
a second portion inserted between the first portion and the stage... the elastic hinges effectively reduce reticle deformation by up to 1/10 of the original deformation
Data Source
AI summary
A stage apparatus that includes a stage and moves the stage in at least a first direction. The stage apparatus also includes a plurality of holding units fixed on the stage to extend in the first direction, in which the first direction is a longitudinal direction. Each of the holding units includes a first portion. A second portion is arranged between the first portion and the stage and a third portion is arranged between the second portion and the stage. The first portion includes a holding surface to hold an object. A length of the second portion in the first direction is less than a length of the first portion in the first direction, and the length of the second portion in the first direction is less than a length of the third portion in the first direction. Ends of the second portion are determined by two slits extending from both ends of the holding units in the first direction towards a central portion of the holding units, and the first portion is connected to the third portion at only one point via the second portion.