Elastic Membrane Stretching Without Dummy Wafers
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Solution Overview
Problem
The existing methods for enhancing the elasticity of a newly replaced elastic membrane in a substrate holding apparatus require the use of dummy wafers, leading to increased costs and longer processing times due to the need for multiple dummy wafers and extensive processing sequences.
Innovation Solution
A program and method for performing a stretching operation of the elastic membrane by supplying pressurized fluid to a pressure chamber and allowing it to open to the atmosphere, utilizing a pressure regulating device, without the need for a dummy wafer, which includes moving the substrate holding apparatus to a predetermined position above the polishing table, lowering it to contact the polishing pad, and then elevating it, thereby enhancing the membrane's elasticity in a short time.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Stability of the object's composition
If dummy wafers are used to enhance the elasticity of the elastic membrane, then the membrane elasticity is improved, but the cost increases due to consumption of multiple dummy wafers
Solution Approach 1:
The patent extracts the essential function of enhancing membrane elasticity from the dummy wafer processing context. By removing the dummy wafer from the system and directly applying pressurized fluid to the pressure chamber, the solution achieves the same elasticity enhancement effect without consuming any substrate material.
Solution Approach 2:
The patent introduces pressurized fluid as an intermediary to transfer the stretching force to the elastic membrane. Instead of using a physical dummy wafer that must be processed through multiple steps, the pressurized fluid directly applies force to the pressure chamber, causing the membrane to stretch and enhance its elasticity without any material consumption.
2Stability of the object's composition
If dummy wafers are used to enhance the elasticity of the elastic membrane, then the membrane elasticity is improved, but the processing time increases due to extensive processing sequences
Solution Approach 1:
The patent removes the time-consuming processing steps (polishing, cleaning, drying) from the elasticity enhancement process by extracting the essential function - applying mechanical stress to the membrane. Only the necessary pressurization step remains, eliminating unnecessary processing time.
Solution Approach 2:
The patent performs the elasticity enhancement action directly and immediately through pressurization, without requiring preliminary setup of dummy wafers or subsequent processing steps. The pressurized fluid is supplied directly to the pressure chamber, causing immediate stretching and elasticity enhancement in a single operation.
3Productivity
If the substrate holding apparatus is positioned above the polishing table during standby operation, then the stretching operation can be performed, but the device complexity increases
Solution Approach 1:
The patent makes the positioning system multi-functional by using the same substrate holding apparatus positioning mechanism for both normal polishing operations and the stretching operation. The apparatus can be positioned above the polishing table for both purposes, eliminating the need for a separate positioning system specifically for elasticity enhancement.
Solution Approach 2:
The existing positioning control system of the substrate holding apparatus serves the additional function of positioning for stretching operations. The system uses its own built-in capabilities to achieve the required positioning, without requiring external or additional positioning devices.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This approach reduces the cost associated with dummy wafer consumption and shortens the time required to enhance the membrane's elasticity, allowing for more efficient polishing operations without the need for additional wafers.
Implementation Method 1
supplying a pressurized fluid to a pressure chamber formed by the elastic membrane
Implementation Method 2
enhancing elasticity of the newly replaced elastic membrane
Data Source
AI summary
A non-transitory computer-readable storage medium storing a program of stretching operation of an elastic membrane which can enhance elasticity of an elastic membrane in a short time without using a dummy wafer is disclosed. The non-transitory computer-readable storage medium storing a program of stretching operation of an elastic membrane in a substrate holding apparatus, the program causes a computer to perform stretching operation of supplying a pressurized fluid to a pressure chamber formed by the elastic membrane and allowing the pressure chamber to be open to the atmosphere a predetermined number of times by a pressure regulating device in a state where the substrate holding apparatus is positioned above a polishing table during standby operation of a polishing apparatus.