Elastic Mounting for Lithography Optical Elements

Resolve Bottlenecks,
Find Innovative Solutions
Generate Solutions

Solution Overview

Problem

Existing projection exposure apparatuses for semiconductor lithography face challenges due to temperature fluctuations, which can lead to aberrations and damage to optical elements caused by particle formation from screw ring friction.

Innovation Solution

The apparatus employs an illumination optical unit with optical elements fixed using elastic elements, eliminating the need for screw rings and reducing the risk of particle formation, thereby preventing damage to optical elements.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Strength

If screw rings are used to fix optical elements, then the optical elements can be securely mounted, but particles are generated due to friction between threads which can precipitate on optical elements and cause damage

Engineering Contradiction:
Improvemounting securityVSAvoidparticle generation
Core Design Contradiction:
StrengthVSObject-generated harmful factors

Solution Approach 1:

The patent removes the screw ring component entirely from the optical element mounting system. Instead of using threaded fasteners, the invention employs alternative mounting mechanisms that eliminate the source of particle-generating friction, thereby solving the contradiction between secure mounting and particle-free operation

Inventive Principle:
Principle #2Taking out (Extraction)

Solution Approach 2:

The patent replaces the mechanical screw ring fastening system with a different mounting mechanism that does not rely on threaded friction. This substitution eliminates the harmful particle generation while maintaining the necessary secure mounting of optical elements

Inventive Principle:
Principle #28Mechanics substitution (Replace mechanical system)

2Manufacturing precision

If preheaters are used to compensate for temperature-induced aberrations, then imaging quality can be maintained, but the risk of particle formation and optical element damage increases

Engineering Contradiction:
Improveimaging qualityVSAvoidoptical element damage risk
Core Design Contradiction:
Manufacturing precisionVSObject-affected harmful factors

Solution Approach 1:

The patent eliminates the source of particles by removing screw rings from the preheater's optical element mounting system. This allows the preheater to continue compensating for temperature-induced aberrations and maintaining imaging quality without the risk of particle formation from thread friction

Inventive Principle:
Principle #2Taking out (Extraction)

Solution Approach 2:

The patent introduces alternative mounting mechanisms that act as intermediaries between the preheater housing and optical elements. These intermediaries provide secure mounting while preventing the generation of particles that could damage optical elements, thus mediating between the need for stable mounting and the need for particle-free operation

Inventive Principle:
Principle #24Intermediary (Mediator)

Applied Scientific Principles

This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.

Function Achieved in This Case

This solution effectively prevents particle exposure to the illumination optical unit, maintaining the integrity of optical elements and ensuring consistent imaging quality despite temperature fluctuations.

Implementation Method 1

at least one optical element is fixed within the housing by way of at least one elastic element

Methodology Applied
Scientific EffectElastic force: Elasticity

Implementation Method 2

a heating device for heating at least one element of the projection exposure apparatus by means of electromagnetic radiation

Methodology Applied
Scientific EffectElectromagnetic radiation heating: Electromagnetic Induction

Data Source

PatentUS20250147427A1Projection exposure apparatus for semiconductor lithography
Publication Date: 2025.05.08 CARL ZEISS SMT GMBH
  • US20250147427A1 patent drawing
  • US20250147427A1 patent drawing
  • US20250147427A1 patent drawing

AI summary

A projection exposure apparatus has a heating device for heating at least one element of the projection exposure apparatus via electromagnetic radiation. The heating device comprises an illumination optical unit having a housing and at least one optical element, arranged within the housing, for influencing the electromagnetic radiation. The at least one optical element is fixed within the housing by way of at least one elastic element.