Elastically Deformable Arm for Substrate Alignment
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Solution Overview
Problem
Existing substrate alignment apparatuses for high-end lithography processing are inadequate due to susceptibility of thin semiconductor substrates to distortion and shattering, and fail to provide the necessary accuracy and reproducibility in applying forces during alignment.
Innovation Solution
A lithography system with an alignment apparatus featuring a force generating device comprising an arm with a proximal and distal end, an elastically deformable section, and an actuator that applies a controlled contact force to the substrate, ensuring accurate and reproducible alignment without distorting the substrate.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Measurement precision
If a force is applied to rotate the wafer into proper registration position using fixed rollers and movable brackets, then the wafer alignment is achieved, but the thin semiconductor substrate becomes susceptible to distortion and shattering
Solution Approach 1:
The patent changes the physical state and mechanical properties of the arm from rigid to elastically deformable. This allows the arm to flex under applied force, reducing the transmission of excessive force to the substrate while still achieving the necessary alignment movement, thus preventing substrate distortion and shattering
Solution Approach 2:
The elastically deformable arm acts as an intermediary between the actuator and the substrate. It mediates the force transmission by absorbing excess force through elastic deformation, protecting the substrate from direct exposure to high forces while still enabling precise alignment
2Manufacturing precision
If conventional alignment apparatuses are used to achieve high accuracy alignment, then positioning precision is improved, but the substrates are distorted or shattered due to excessive force application
Solution Approach 1:
The patent modifies the mechanical parameter of the arm's stiffness by making it elastically deformable rather than rigid. This allows controlled force reduction during the alignment process, maintaining positioning precision while eliminating the harmful effect of excessive force on the substrate
Solution Approach 2:
The elastically deformable arm provides beforehand cushioning by being designed to deform elastically under load. This pre-built-in cushioning mechanism protects the substrate from excessive forces before damage can occur, while still allowing precise alignment to be achieved
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The system enables precise alignment of substrates with minimal risk of distortion, allowing for accurate positioning and orientation within the lithography apparatus, suitable for high-end lithography processes like charged particle beam lithography.
Implementation Method 1
an elastically deformable arm section extending between said proximal end and said distal end
Data Source
AI summary
An alignment apparatus for aligning a substrate, and a substrate processing system including such alignment apparatus. The alignment apparatus includes an alignment base for supporting the substrate and/or a substrate support member. A force generating device applies a contact force on the substrate. The force generating device includes an arm including a rigid proximal end and a rigid distal end. The distal end is provided with a contact section for contacting an edge of the substrate and an elastically deformable arm section extending between the proximal and distal ends. The connection part connects the proximal end to the alignment base. The arm is movable with respect to the alignment base via the connection part. The alignment apparatus also includes an actuator for causing a displacement of the proximal end, whereby the contact force, defined by the elastically deformable arm section, is applied to the substrate by the contact section.