Elastomeric Reflection Suppressor for Fresnel Reduction

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Solution Overview

Problem

Current methods for suppressing optical reflections in manufacturing processes, such as photolithography and holography, are either costly, complex, or leave residues on substrates, and existing anti-reflection coatings fail to effectively manage reflections across wide spectral and angular bandwidths.

Innovation Solution

Development of elastomeric reflection suppressors with tunable refractive indices and incorporated absorptive dopants that can be laminated onto substrates to suppress Fresnel reflections, providing broadband or wavelength-selective absorption and being removable without damaging the substrates.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Object-affected harmful factors

If dielectric multi-layer films are used to reduce reflections, then reflection suppression is improved, but cost and manufacturing complexity increase

Engineering Contradiction:
ImproveFresnel reflectionsVSAvoidcoating complexity
Core Design Contradiction:
Object-affected harmful factorsVSDevice complexity

Solution Approach 1:

The patent extracts the reflection suppression function from complex dielectric multi-layer films and implements it using a simple elastomeric material with absorptive dopants. The elastomer itself, combined with absorptive particles, provides the reflection suppression without requiring multiple dielectric layers, thereby simplifying the manufacturing process and reducing costs.

Inventive Principle:
Principle #2Taking out (Extraction)

Solution Approach 2:

The patent changes the material parameters by using elastomeric materials with tunable refractive indices that can be matched to substrates. By adjusting the elastomer composition and adding absorptive dopants, the material achieves both index matching for reflection suppression and broadband absorption, replacing the need for complex multi-layer dielectric structures.

Inventive Principle:
Principle #35Parameter changes

2Object-affected harmful factors

If index-matched oil is used between surfaces, then Fresnel reflections are reduced, but the oil is messy, penetrates parts, and leaves residues

Engineering Contradiction:
ImproveFresnel reflectionsVSAvoidresidues and contamination
Core Design Contradiction:
Object-affected harmful factorsVSObject-generated harmful factors

Solution Approach 1:

The elastomeric reflection suppressor is designed as a disposable or easily replaceable component. After use, it can be removed and discarded or regenerated without causing contamination to the substrate, unlike index-matched oils that leave residues and penetrate parts. The elastomer contains the absorptive dopants within its matrix, preventing leakage and contamination.

Inventive Principle:
Principle #27Cheap short-living objects (Disposable)

Solution Approach 2:

The patent uses composite materials by incorporating absorptive dopants (such as carbon black, metal oxides, or organic dyes) within the elastomeric matrix. This composite structure provides both the mechanical properties of the elastomer and the optical absorption properties of the dopants, achieving reflection suppression without the contamination issues of liquid oils.

Inventive Principle:
Principle #40Composite materials

3Object-affected harmful factors

If standard anti-reflection coatings are used, then reflections are suppressed at specific wavelengths, but performance is limited across wide spectral and angular bandwidths

Engineering Contradiction:
Improvereflections at specific wavelengthsVSAvoidspectral and angular bandwidth
Core Design Contradiction:
Object-affected harmful factorsVSAdaptability or versatility

Solution Approach 1:

The elastomeric reflection suppressor achieves multi-functionality by combining index matching with broadband absorption. The elastomer material can be formulated to match the refractive index of various substrates while simultaneously providing broadband absorption across UV, visible, and infrared wavelengths. This single material replaces the need for wavelength-specific dielectric coatings, achieving universal reflection suppression across wide spectral and angular ranges.

Inventive Principle:
Principle #6Universality (Multi-functionality)

Applied Scientific Principles

This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.

Function Achieved in This Case

The elastomeric reflection suppressors significantly reduce reflections by over 30 dB across ultraviolet to infrared wavelengths and broad angular ranges, outperforming traditional anti-reflection coatings and allowing for reusable, residue-free operation.

Implementation Method 1

An absorptive dopant can be incorporated into the elastomer to absorb specific wavelengths across an optical spectrum

Methodology Applied
Scientific EffectAbsorption (EM radiation): Absorption (EM radiation)

Implementation Method 2

The refractive index of the elastomer can be tuned to match a substrate and minimize reflection

Methodology Applied
Scientific EffectRefraction: Refraction

Data Source

PatentUS11719859B2Elastomeric reflection suppressor
Publication Date: 2023.08.08 THE REGENTS OF THE UNIVERSITY OF COLORADO
  • US11719859B2 patent drawing
  • US11719859B2 patent drawing
  • US11719859B2 patent drawing

AI summary

Various embodiments of the present technology generally relate to reflection suppressors. More specifically, some embodiments use elastomeric materials doped with optical absorbers for temporary suppression of Fresnel reflections for multiple substrates spanning wide spectral and angular bandwidth. The refractive index of the elastomer can be tuned to match a substrate and thereby minimize reflection. Some embodiments can use the addition of different absorptive dopants to allow for either broadband or wavelength-selective reflection suppression. As performance is limited only by index mismatch, both spectral and angular performance significantly exceed that of anti-reflection coatings. After use, these light traps may be removed and reused without damaging the substrate. These films have uses in spectroscopic ellipsometry, holography, and lithography.