Elastomeric Roll and UV-C Cleaning System for Substrate Decontamination
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Solution Overview
Problem
Current cleaning systems for substrates, particularly those with thin films or specialist coatings, face challenges in removing organic contaminants without damaging the substrate, as existing methods like solvent use and plasma treatment can be difficult to control and may degrade the surface, and require expensive equipment and additional processing steps.
Innovation Solution
A system utilizing elastomeric rolls for inorganic contaminant removal and an electromagnetic radiation source emitting wavelengths between 10 nm to 280 nm, specifically 170 nm to 180 nm, to effectively decontaminate organic contaminants while activating the surface for further manufacturing steps, allowing for controlled and cost-effective cleaning across large areas.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Reliability
If plasma treatment is used to remove organic contaminants, then cleaning effectiveness is improved, but substrate damage and equipment cost increase
Solution Approach 1:
The patent replaces the plasma treatment system (electrical/thermal field) with an elastomeric roll mechanical contact system. The elastomeric roll physically removes organic contaminants through controlled mechanical contact, eliminating the need for high-power plasma that causes substrate damage while maintaining effective cleaning.
Solution Approach 2:
The patent changes the cleaning mechanism from high-energy plasma treatment to low-energy mechanical contact with elastomeric material. This parameter change in the cleaning approach allows effective organic contaminant removal without the harmful thermal and electrical effects of plasma that damage the substrate.
2Reliability
If plasma treatment is used to remove organic contaminants, then cleaning effectiveness is improved, but equipment complexity and cost increase
Solution Approach 1:
The patent replaces the complex plasma generation and control system with a simple elastomeric roll mechanism. The elastomeric roll system requires no electrical plasma generation, control systems, or specialized chambers, dramatically reducing equipment complexity and cost while maintaining cleaning effectiveness.
Solution Approach 2:
The patent uses elastomeric rolls that can be easily replaced rather than maintaining complex, expensive plasma equipment. The elastomeric material is inexpensive and can be renewed, eliminating the need for costly plasma generators and control systems.
3Reliability
If plasma treatment is used to clean substrates, then organic contaminant removal is improved, but additional processing steps are required
Solution Approach 1:
The elastomeric roll system performs both inorganic and organic contaminant removal in a single mechanical contact step, eliminating the need for separate plasma treatment step that would be required for organic contaminants. This integrates multiple cleaning functions into one process.
4Reliability
If aggressive cleaning methods are used to remove organic contaminants, then cleaning effectiveness is improved, but substrate surface degradation increases
Solution Approach 1:
The patent uses gentle mechanical contact with elastomeric material instead of aggressive plasma treatment. The elastomeric roll applies controlled, low-force contact that effectively removes contaminants without the harsh thermal and electrical fields of plasma that degrade substrate surface quality and manufacturing precision.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The system provides a controlled and cost-effective method to remove both inorganic and organic contaminants without damaging the substrate, enabling immediate use in subsequent manufacturing processes by tuning the cleaning power and wavelength to suit specific contaminants and materials, ensuring effective decontamination and activation of the surface.
Implementation Method 1
an electromagnetic radiation source adapted to selectively emit electromagnetic radiation with a wavelength in a range of 10 nm to 280 nm to irradiate at least the first surface of the object so as to activate at least the first surface and to decontaminate organic contaminants therefrom
Data Source
AI summary
The present invention relates generally to a system and a method for cleaning the surface of an object. More particularly, the present invention relates to a system and a method that removes inorganic contaminants from the surface of the object and then activates the surface and removes organic contaminants therefrom. The system for cleaning an object includes a first cleaner (120), including at least one elastomeric roll (122), rotatably mounted to said first cleaner and having a generally cylindrical outer surface configured to contact a first surface of the object for removing inorganic contaminants. The system also includes at least one adhesive roll (424,434), rotatably mounted to said first cleaner and having a generally cylindrical outer surface in contact with a portion of said outer surface of said at least one elastomeric roll. Additionally, the system includes at least one second cleaner (440), configured to operably receive the object from said first cleaner, and comprising an electromagnetic radiation source (342) adapted to selectively emit electromagnetic radiation with a wavelength in a range of 10 nm to 280 nm to irradiate at least the first surface of the object so as to activate at least the first surface and to decontaminate organic contaminants therefrom.