Electric Field Guided Acid Diffusion for Lithography Roughness
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Solution Overview
Problem
The challenge in photolithography is controlling line edge/width roughness as dimensions of integrated circuit components decrease, requiring precise and accurate transfer of smaller features onto substrates, which is difficult due to random diffusion of acids generated by photoacid generators during post-exposure bake.
Innovation Solution
Applying an electric field and/or magnetic field during photolithography processes to control the diffusion of acids along the line and spacing direction, using an apparatus with a substrate support and electrode assembly that generates an electric field parallel to the substrate surface, thereby minimizing line edge/width roughness.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Productivity
If the dimensions of integrated circuit components are reduced to increase circuit density, then more elements can be placed in a given area, but the roughness of the edges of the photoresist layer becomes harder to control
Solution Approach 1:
The patent applies external electric and/or magnetic fields during the post-exposure bake process to control the diffusion of photo-generated acids. By changing the physical parameters (applying external fields) during the chemical process, the random diffusion of acids is directed to be more uniform, thereby reducing line edge roughness while maintaining the ability to produce high-density circuit features
Solution Approach 2:
The patent replaces the purely chemical diffusion process with a combined physical-field-controlled process. External electric and/or magnetic fields are introduced to control the movement of charged species and acid diffusion, substituting the uncontrolled chemical diffusion mechanism with a physically controlled process that reduces edge roughness
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The application of electric and/or magnetic fields directs acid diffusion uniformly, reducing line edge/width roughness and enhancing the precision of feature transfer in photolithography, improving the accuracy and resolution of pattern formation on substrates.
Implementation Method 1
The electrode assembly is configured to generate an electric field in a direction substantially parallel to the surface of the substrate support
Implementation Method 2
a heat source configured to heat a substrate positioned on the substrate support
Implementation Method 3
Exposure to light may decompose the photo acid generator, which generates acid and results in a latent acid image in the resist resin
Data Source
AI summary
Methods and apparatuses for minimizing line edge/width roughness in lines formed by photolithography are provided. The random diffusion of acid generated by a photoacid generator during a lithography process contributes to line edge/width roughness. Methods disclosed herein apply an electric field and/or a magnetic field during photolithography processes. The field application controls the diffusion of the acids generated by the photoacid generator along the line and spacing direction, preventing the line edge/width roughness that results from random diffusion. Apparatuses for carrying out the aforementioned methods are also disclosed herein.