Electrochromic Ablation Patterns to Reduce Light Diffraction
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Solution Overview
Problem
Electrochromic devices with non-randomized ablation patterns can be visible and cause undesirable optical effects such as light scattering and diffraction, which can be minimized by using controlled, randomized ablation patterns to alter the properties and performance of the conductive layers.
Innovation Solution
The implementation of randomized ablation patterns on the surface of electrochromic devices, which include variations in geometrical characteristics such as distance, orientation, and shape of segments, to reduce diffraction and scatter of light, and to modify the sheet resistance of conductive layers for uniform and faster switching.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Ease of manufacture
If non-randomized ablation patterns are used on conductive layers, then manufacturing is simpler, but visible patterns cause light scattering and diffraction
Solution Approach 1:
The patent applies asymmetry by using randomized ablation patterns instead of symmetric or regular patterns. The ablation features are distributed in a controlled random manner, breaking the periodicity that causes diffraction while maintaining manufacturing feasibility through automated random pattern generation and laser processing
Solution Approach 2:
The patent changes the spatial distribution parameters of ablation features from regular intervals to randomized positions. By controlling the randomness parameters (such as mean spacing, standard deviation, and distribution function), the patent eliminates diffraction effects while maintaining consistent optical performance across the conductive layer
2Productivity
If ablation patterns are applied to conductive layers, then sheet resistance is modified for faster switching, but visible patterns and optical defects are introduced
Solution Approach 1:
The randomized asymmetric distribution of ablation features modifies the electrical properties uniformly across the conductive layer without creating periodic structures that would scatter light. This asymmetric randomization achieves both electrical performance improvement and optical quality maintenance
Solution Approach 2:
The patent applies local quality by creating ablation features with specific local characteristics (depth, diameter, spacing) that are optimized for electrical conductivity modification, while the overall random distribution ensures no local region creates diffraction effects. Each local area has appropriate ablation density for sheet resistance control without visible patterning
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The use of randomized ablation patterns enhances the optical properties of electrochromic devices by minimizing undesirable optical effects and improving switching performance, resulting in more uniform and efficient electrochromic behavior.
Implementation Method 1
laser ablating a surface of an electrochromic (EC) device according to a randomized ablation pattern
Implementation Method 2
reduce diffraction and scatter of light incident on the surface ablations
Implementation Method 3
reduce diffraction and scatter of light incident on the surface ablations
Implementation Method 4
electrochromic materials that are known to change their optical properties, such as coloration, in response to the application of an electrical potential difference
Implementation Method 5
ions, which can include Li+ ions stored in the CE layer, flow from the CE layer, through the IC layer and to the EC layer
Data Source
AI summary
Various embodiments relate to an electrochromic (EC) device that is structured with surface contour features arranged according to a randomized pattern. For example, one or more conductive layers of an EC device may be structured with such surface ablations. In some embodiments, the randomized ablation pattern may comprise a randomized variation in one or more geometrical characteristics of a group of segments. In some examples, the geometrical characteristic(s) may include a distance characteristic, an orientation characteristic, and/or a shape characteristic, etc. According to various embodiments, the randomized ablation pattern may be configured to reduce diffraction and/or scatter of light incident on the surface ablations as compared to some other ablation patterns.