Electrochromic Layer Deposition With Intermediate Particle Removal
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Solution Overview
Problem
Conventional electrochromic windows suffer from high defectivity and low versatility due to issues like short circuits and pinholes caused by particle contamination during the fabrication process, which affect their performance and visual quality.
Innovation Solution
A particle removal operation is integrated into the electrochromic device fabrication process, which involves techniques such as contact cleaning, irradiation, heat treatment, plasma treatment, and laser radiation to remove particles before the electrochromic and counter electrode layers are fully formed, reducing the likelihood of short circuits and defects.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Reliability
If conventional fabrication process is used without particle removal operation, then the fabrication process is simple and fast, but the device suffers from high defectivity and short circuits due to particle contamination
Solution Approach 1:
The particle removal operation is performed at an intermediate stage during deposition, before both electrochromic and counter electrode layers are fully formed. This preliminary action removes particles before they can cause short circuits, improving device reliability without requiring complete redesign of the fabrication process
Solution Approach 2:
A particle removal operation is introduced as an intermediary step between layer depositions. This intermediary process uses plasma treatment, contact cleaning, or other methods to remove particles from the partially-formed device, preventing defects while maintaining process feasibility
2Manufacturing precision
If particle removal operation is performed at intermediate stage, then the number of visible short-related pinholes is reduced, but the fabrication process time and complexity increase
Solution Approach 1:
The particle removal operation is applied partially during the fabrication process rather than continuously. It is performed at specific intermediate stages when needed, removing particles before they can cause defects, rather than applying full particle removal throughout the entire process
Solution Approach 2:
The fabrication process parameters are changed by introducing controlled particle removal operations at specific stages. The timing and intensity of particle removal are optimized to achieve sufficient defect reduction while minimizing impact on overall fabrication time
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The process significantly reduces the number of visible short-related pinholes and defects, improving the performance and visual quality of electrochromic devices by minimizing electrical shorts and enhancing the reliability of electrochromic windows.
Implementation Method 1
the contact cleaning removes particles from the surface of the partially-formed electrochromic device by static electricity and/or adhesion
Implementation Method 2
the particle removal operation involves irradiating the surface of the partially-formed electrochemical device. The irradiation may produce a volumetric expansion of the particles to be removed
Implementation Method 3
the particle removal operation includes a heat treatment of the partially-formed electrochromic device. The heat treatment may involve heating the particles to be removed so as to cause the particles to volumetrically expand
Implementation Method 4
the particle removal operation includes contacting the surface of the partially-formed electrochromic device with a plasma
Implementation Method 5
Some examples of the particle-removal operation include contact cleaning, irradiation, heat treatment, plasma treatment, contact with supercritical fluid, acoustic vibration
Implementation Method 6
Some examples of the particle-removal operation include contact cleaning, irradiation, heat treatment, plasma treatment, contact with supercritical fluid
Data Source
AI summary
Electrochromic devices are fabricated using a particle removal operation that reduces the occurrence of electronically conducting layers and/or electrochromically active layers from contacting layers of the opposite polarity and creating a short circuit in regions where defects form. In some embodiments, the particle removal operation is not a lithiation operation. In some embodiments, the particle removal operation is performed at an intermediate stage during the deposition of either an electrochromic layer or a counter electrode layer.