Electrochromic Shutter for Spike Anneal Temperature Control
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Solution Overview
Problem
Thermal processing systems face challenges in tightly controlling the temperature profile during spike anneal processes, leading to excessive dopant diffusion in semiconductor wafers due to broad peak widths in thermal treatment processes.
Innovation Solution
A thermal processing system with a shutter containing electrochromic material that can switch between translucent and opaque states, controlled by a controller to reduce light transmission and narrow the peak width of the thermal treatment process, thereby limiting dopant diffusion.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Temperature
If a conventional heat source is used to heat the workpiece during spike anneal process, then the workpiece can be heated to high temperatures, but the temperature profile cannot be tightly controlled resulting in broad peak widths and excessive dopant diffusion
Solution Approach 1:
The patent applies a dynamic shutter mechanism that can rapidly transition between open and closed states to modulate heat input during the annealing process. This dynamic control allows the system to achieve tight temperature profile control by adjusting the duration and timing of heat exposure, thereby reducing peak width and preventing excessive dopant diffusion while maintaining high temperature processing capability.
Solution Approach 2:
The patent changes the temporal parameters of heat input by controlling the shutter opening and closing times. By adjusting these time parameters, the system achieves precise control over the temperature profile, reducing the peak width to 0.8 seconds or less while maintaining the necessary high temperature for effective annealing.
2Use of energy by moving object
If the shutter remains open during thermal treatment process, then light transmission is maximized for heating, but temperature control precision deteriorates due to inability to modulate heat input
Solution Approach 1:
The patent employs periodic or pulsed action by controlling the shutter to open and close at specific intervals during the thermal treatment process. This allows the system to maximize light transmission during heating phases while blocking light during control phases, achieving both high energy utilization and precise temperature control through timed modulation of heat input.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The system achieves precise temperature control during spike anneal processes, allowing for effective annealing at high temperatures while minimizing dopant diffusion by reducing the peak width to 0.8 seconds or less.
Implementation Method 1
The shutter includes an electrochromic material configurable in a translucent state and an opaque state. When the electrochromic material is configured in the opaque state, the shutter reduces transmission of the light through the shutter, and when the electrochromic material is configured in the translucent state, the light at least partially passes through the shutter.
Implementation Method 2
The system includes a heat source configured to emit light toward the workpiece
Data Source
AI summary
Apparatus, systems, and methods for processing workpieces are provided. In one example, the system includes a processing chamber. The system includes a workpiece support configured to support a workpiece within the processing chamber. The system includes a heat source configured to emit light toward the workpiece. The system includes a shutter disposed between the workpiece and the heat source. The shutter includes an electrochromic material configurable in a translucent state and an opaque state. When the electrochromic material is configured in the opaque state, the shutter reduces transmission of the light through the shutter, and when the electrochromic material is configured in the translucent state, the light at least partially passes through the shutter. The system includes a controller configured to control the shutter to reduce transmission of light through the shutter during a thermal treatment process.