Electrode Structure Patterning With Anodized Bridge Isolation
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Solution Overview
Problem
Traditional display manufacturing processes are complex and costly, with many steps required to produce a display, and there is a need to reduce the number of steps to enhance efficiency and lower costs.
Innovation Solution
A method of manufacturing an electrode structure that involves forming a first patterned photoresist on a bottom metal layer, etching the metal layer to create specific patterns and bridges, anodizing the metal layer, removing the photoresist, depositing a conductive layer, and etching to electrically open the bridge, all while using only two sets of Photo Engraving Process (PEP).
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Ease of manufacture
If traditional display manufacturing processes are used, then manufacturing precision and reliability are maintained, but process complexity and manufacturing cost increase significantly
Solution Approach 1:
The patent combines multiple manufacturing steps into a unified process. Specifically, the photoresist structure serves dual purposes: as an etch mask for forming metal patterns and as a template for subsequent anodization. The anodization process itself creates both the insulating layer and defines the floating island structure, eliminating the need for separate deposition and patterning steps that would traditionally be required.
Solution Approach 2:
The patent performs preliminary structuring of the photoresist by forming regions of different thicknesses before the etching process. This preliminary action allows the photoresist to function as both an etch mask and a pattern transfer template for anodization, enabling subsequent steps to proceed without additional patterning operations.
2Manufacturing precision
If multiple photoresist patterning steps are used to form complex electrode structures, then manufacturing precision is improved, but productivity decreases and time consumption increases
Solution Approach 1:
The photoresist structure is designed to perform multiple functions simultaneously: it acts as an etch mask for the metal layer, serves as a pattern template for anodization, and defines the floating island structure. This multi-functionality eliminates the need for separate patterning steps while maintaining precise electrode formation.
Solution Approach 2:
The photoresist is segmented into regions of different thicknesses during formation, with thicker regions serving as masks for specific areas and thinner regions allowing pattern transfer. This segmentation enables precise control over where metal patterns are formed and where floating islands are created, all within a single patterning process.
3Reliability
If conventional electrode structure manufacturing is used, then structural integrity is maintained, but manufacturing cost and process time increase
Solution Approach 1:
The patent implements a continuous manufacturing process where the photoresist structure is formed once and then used sequentially for etching and anodization without removal or replacement. The anodization process continuously builds the insulating layer and floating island structure in a single operation, eliminating idle time between separate deposition and patterning steps.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This method reduces the complexity and cost of manufacturing electrode structures by simplifying the process and enhancing efficiency, allowing for the formation of a floating island structure and enabling the production of thin-film transistors with reduced operational costs.
Implementation Method 1
anodizing the bottom metal layer with the remained second mask portion covering thereon by flowing an anodizing current from the first metal pattern to the second metal pattern via the at least one bridge
Data Source
AI summary
A method of manufacturing an electrode structure includes: etching the bottom metal layer through a first patterned photoresist including first and second mask portions to form a first metal pattern, a second metal pattern, and a bridge connected therebetween; removing the first mask portion; anodizing the bottom metal layer with the remained second mask portion by flowing an anodizing current from the first metal pattern; removing the remained second mask portion; depositing a conductive layer on the bottom metal layer to be in contact with an area of the second metal pattern that is unanodized; etching the conductive layer through a second patterned photoresist until an open segment of the bridge is exposed; and etching the open segment of the bridge through the second patterned photoresist until the bridge is electrically opened.