Excitation Electrode Cooling Layout for Stable Plasma Temperature
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Solution Overview
Problem
Existing substrate processing apparatuses face challenges in maintaining consistent temperature control of components, particularly the excitation electrode, during plasma processing, which affects processing efficiency and stability.
Innovation Solution
A plasma processing apparatus with a temperature regulator system that includes a flow path for a heat medium, utilizing fans and a flow path symmetrical to the central axis, along with a cooler to maintain consistent temperature of the excitation electrode by adjusting fan speed and heater power based on temperature sensors.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Temperature
If a conventional cooling mechanism is used for the excitation electrode, then the electrode temperature can be reduced, but the temperature uniformity and control stability deteriorate
Solution Approach 1:
The cooling mechanism is segmented into multiple independent cooling regions corresponding to different radial positions on the excitation electrode. Each cooling region has its own heat medium supply and control, allowing independent temperature adjustment for each segment. This segmentation enables precise control of temperature uniformity across the electrode surface while effectively reducing overall temperature.
Solution Approach 2:
Different regions of the excitation electrode are provided with different cooling characteristics and heat medium flow rates according to their specific thermal requirements. The inner radius region, outer radius region, and intermediate regions each receive customized cooling treatment, achieving optimal temperature uniformity across the entire electrode surface while maintaining effective temperature reduction.
2Temperature
If the heat medium flow rate is increased to improve cooling efficiency, then the temperature reduction improves, but the energy consumption increases
Solution Approach 1:
The heat medium flow rate is made dynamically adjustable for each cooling region based on real-time temperature feedback and processing requirements. The control unit varies the flow rate within a predetermined range to optimize the balance between cooling efficiency and energy consumption, avoiding excessive energy use while maintaining effective temperature control.
Solution Approach 2:
The system changes the flow rate parameter of the heat medium according to the operational state and thermal requirements. By adjusting the flow rate parameter within optimal ranges, the system achieves effective cooling while minimizing energy consumption, resolving the contradiction between cooling performance and energy efficiency.
3Measurement precision
If multiple temperature sensors are added to improve temperature monitoring accuracy, then the temperature control precision improves, but the device complexity increases
Solution Approach 1:
Temperature sensors are strategically positioned at specific asymmetric locations corresponding to the inner radius region, outer radius region, and intermediate regions of the excitation electrode. This asymmetric but targeted sensor placement provides comprehensive temperature monitoring coverage without requiring sensors at every position, thereby maintaining measurement precision while avoiding excessive device complexity.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The system ensures stable temperature control of the excitation electrode, enhancing processing efficiency and stability by maintaining the electrode temperature within a target range during plasma generation and non-generation states.
Implementation Method 1
The temperature regulator includes a plurality of fans configured to create a flow of the heat medium
Implementation Method 2
The temperature regulator is configured to supply a heat medium along an upper surface of the excitation electrode
Implementation Method 3
The emitter is provided to emit electromagnetic waves to a plasma generation space below the excitation electrode
Data Source
AI summary
A plasma processing apparatus includes a temperature regulator, which includes a plurality of fans and provides a flow path, wherein the flow path is axially or rotationally symmetrical with respect to a central axis and includes a first partial flow path and a second partial flow path, and wherein the first partial flow path extends along an upper surface of an excitation electrode, and the second partial flow path extends alternately in opposite directions between the plurality of fans and the first partial flow path.