Electronic Device Electrode Encapsulation Shadow Mask Elimination

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Solution Overview

Problem

Current electronic devices face challenges in miniaturization and integration due to performance degradation caused by the use of shadow masks during the formation of active layers and opposed electrodes, leading to contamination and reduced uniformity of patterns.

Innovation Solution

The electronic device employs a novel structure with a opposed electrode and encapsulation films having a common planar shape, formed without a shadow mask, where the opposed electrode covers the active layer and encapsulation films are etched simultaneously to prevent direct exposure to heat, light, and chemicals, and to enhance encapsulation performance.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Manufacturing precision

If shadow masks are used during the formation of active layers and opposed electrodes, then pattern formation is achieved, but contamination occurs and uniformity of patterns is reduced

Engineering Contradiction:
Improveuniformity of patternsVSAvoidcontamination
Core Design Contradiction:
Manufacturing precisionVSObject-generated harmful factors

Solution Approach 1:

The patent removes the shadow mask from the manufacturing process entirely. Instead of using a shadow mask to define patterns, the invention forms the opposed electrode and encapsulation film with a common planar shape through direct deposition and etching processes, eliminating the source of contamination and uniformity issues associated with shadow masks

Inventive Principle:
Principle #2Taking out (Extraction)

Solution Approach 2:

The patent replaces the mechanical shadow mask system with a chemical etching process. Rather than physically blocking deposition with a mask, the invention deposits materials uniformly and then uses selective etching to create the desired patterns, substituting a mechanical approach with a chemical one that avoids contamination

Inventive Principle:
Principle #28Mechanics substitution (Replace mechanical system)

2Ease of manufacture

If shadow masks are used during the formation of active layers and opposed electrodes, then electrode patterns are formed, but electrode material deposition on shadow masks occurs

Engineering Contradiction:
Improveelectrode pattern formationVSAvoidelectrode material deposition on shadow masks
Core Design Contradiction:
Ease of manufactureVSLoss of substance

Solution Approach 1:

The shadow mask is completely removed from the process, eliminating the problem of electrode material depositing on it. The patent forms patterns through selective etching of deposited layers rather than through shadow mask-based deposition

Inventive Principle:
Principle #2Taking out (Extraction)

Solution Approach 2:

The patent discards the shadow mask approach entirely and adopts an alternative methodology where excess material is removed through etching rather than being blocked during deposition, eliminating waste on the mask surface

Inventive Principle:
Principle #34Discarding and recovering

3Reliability

If encapsulation films are formed after opposed electrode, then encapsulation is achieved, but direct exposure to heat, light, and chemicals occurs

Engineering Contradiction:
Improveencapsulation performanceVSAvoidexposure to heat, light, and chemicals
Core Design Contradiction:
ReliabilityVSObject-affected harmful factors

Solution Approach 1:

The patent forms the encapsulation film concurrently with the opposed electrode through simultaneous deposition and etching processes, rather than sequentially. This preliminary formation of the encapsulation structure protects the active layer from harmful exposures during subsequent processing steps

Inventive Principle:
Principle #10Preliminary action

Solution Approach 2:

The encapsulation film acts as an intermediary protective layer that is formed early in the process. By establishing this protective barrier concurrently with electrode formation rather than afterward, the active layer is shielded from heat, light, and chemical exposure during later manufacturing steps

Inventive Principle:
Principle #24Intermediary (Mediator)

Applied Scientific Principles

This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.

Function Achieved in This Case

This approach reduces contamination and improves performance by preventing electrode material deposition on shadow masks and maintaining uniformity, resulting in a more reliable and efficient electronic device.

Implementation Method 1

forming a thin film associated with a first encapsulation film on the conductive layer associated with the opposed electrode

Methodology Applied
Scientific EffectPhysical Vapour Deposition: Physical Vapour Deposition

Implementation Method 2

forming a thin film associated with a first encapsulation film on the conductive layer associated with the opposed electrode

Methodology Applied
Scientific EffectChemical Vapour Deposition: Chemical Vapour Deposition

Implementation Method 3

simultaneously or sequentially etching the thin film associated with the first encapsulation film and the conductive layer associated with the opposed electrode

Methodology Applied
Scientific EffectPlasma Etching: Plasma

Data Source

PatentUS11387278B2Electronic devices and methods of manufacturing the same
Publication Date: 2022.07.12 SAMSUNG ELECTRONICS CO LTD
  • US11387278B2 patent drawing
  • US11387278B2 patent drawing
  • US11387278B2 patent drawing

AI summary

An electronic device includes a plurality of pixel electrodes, an active layer on the plurality of pixel electrodes, an opposed electrode on the active layer and covering an entirety of an upper surface of the active layer, and a first encapsulation film on the opposed electrode wherein the opposed electrode and the first encapsulation film have a common planar shapes.