Transparent Electrode Groove Integration in Array Substrates
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Solution Overview
Problem
The high production cost and complexity of mask processes in manufacturing TFT-LCD array substrates hinder production capacity and yield, as they require multiple mask steps.
Innovation Solution
A manufacturing method for array substrates that forms a transparent electrode within a groove in the passivation layer using an ashing process with a photoresist, eliminating the need for a mask and reducing the number of production steps.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Manufacturing precision
If a mask process is used to form the pixel electrode, then the electrode pattern can be precisely formed, but the production cost increases and production capacity decreases
Solution Approach 1:
The patent extracts and removes the mask from the manufacturing process. Instead of using a mask to define the pixel electrode pattern, the invention forms the electrode directly through a self-aligned process where the electrode material is deposited conformally on the passivation layer and then planarized, eliminating the need for mask alignment and exposure steps while maintaining pattern precision
Solution Approach 2:
The patent introduces a planarization layer as an intermediary between the pixel electrode and the liquid crystal layer. This planarization layer allows the pixel electrode to be formed without a mask by providing a flat surface for subsequent processing, while the electrode pattern is defined by the underlying TFT structure and passivation layer geometry
2Manufacturing precision
If multiple mask processes are used to form the array substrate, then the structural precision is improved, but the number of production steps increases and yield decreases
Solution Approach 1:
The patent merges multiple separate mask processes into a single integrated formation step. The pixel electrode, common electrode, and other conductive structures are formed simultaneously through conformal deposition and planarization, combining what would traditionally require multiple sequential mask steps into one unified process, thereby reducing complexity and increasing yield
Solution Approach 2:
The patent performs preliminary structuring of the passivation layer and underlying TFT elements before electrode formation. The passivation layer is patterned with grooves or recesses that pre-define the electrode regions, so that when electrode material is deposited, the pattern is automatically established without requiring a mask during the electrode formation step itself
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This approach simplifies the manufacturing process, lowers production costs, and enhances the efficiency of liquid crystal display devices by integrating the transparent electrode directly into the passivation layer groove, improving light transmittance and operational efficiency.
Implementation Method 1
forming a transparent electrode within a groove in the passivation layer using an ashing process with a photoresist
Data Source
Figure 1~2a
Figure 2b~2c
Figure 2d~2e
AI summary
An array substrate and a manufacturing method thereof and a display device are provided, and the array substrate comprises: a substrate (1); a thin film transistor, a passivation layer (5) and a transparent electrode (6), sequentially formed on the substrate, wherein a groove (51) is formed in an upper surface of the passivation layer (5), and the transparent electrode (6) is provided in the groove (51).