Lower Electrode Pressing Ring Feedback to Prevent Wafer Crushing
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Solution Overview
Problem
Conventional ion beam etching machines often crush the to-be-etched components, such as wafers, during the etching process due to inadequate positioning and pressing mechanisms.
Innovation Solution
The ion beam etching machine incorporates a lower electrode structure with a pressing ring mechanism, a lifting mechanism, and a position detection mechanism. The pressing ring mechanism supports the to-be-etched component, while the lifting mechanism controls its movement. The position detection mechanism, comprising an elastic member and a sensor, accurately detects the position of the pressing ring mechanism to prevent excessive descent and potential crushing.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Reliability
If the lifting mechanism drives the supporting component to descend to press the to-be-etched component on the electrode plate, then the to-be-etched component is firmly fixed, but the to-be-etched component is prone to being crushed
Solution Approach 1:
The patent introduces a position detection mechanism that detects the position of the pressing ring mechanism and provides feedback to the lifting mechanism. The lifting mechanism stops driving the pressing ring mechanism to descend based on the detection information, preventing over-pressing and crushing of the to-be-etched component while ensuring firm fixation.
2Reliability
If the pressing ring mechanism descends to press the to-be-etched component, then the component is securely positioned, but the positioning precision is insufficient without position detection
Solution Approach 1:
The position detection mechanism detects the position of the pressing ring mechanism and provides feedback to the lifting mechanism, enabling precise control of the pressing depth. This ensures the component is securely positioned without excessive pressing that could cause damage.
3Device complexity
If conventional supporting component is used, then the structure is simple, but the to-be-etched component is prone to crushing during pressing
Solution Approach 1:
The patent adds a position detection mechanism and control logic to the conventional pressing structure. The lifting mechanism stops driving the pressing ring mechanism to descend based on detection information from the position detection mechanism, preventing over-pressing and crushing while maintaining relatively simple overall structure.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This configuration effectively prevents the to-be-etched components from being crushed, thereby improving product yield and reducing costs associated with damaged components.
Implementation Method 1
The elastic member is configured to be deformed in a lifting direction of the pressing ring mechanism. The sensor is configured to detect a deformation amount of the elastic member.
Data Source
AI summary
An ion beam etching machine and a lower electrode structure thereof. The lower electrode structure comprises an electrode plate, a ring pressing mechanism, and a lifting mechanism, the ring pressing mechanism being configured to support a member to be etched, and the lifting mechanism being configured to drive the ring pressing mechanism to ascend and descend relative to the electrode plate; and same further comprises a position measurement mechanism for measuring a position to which the ring pressing mechanism descends relative to the electrode plate. The lifting mechanism is configured to stop driving the ring pressing mechanism to descend based on measurement information fed back by the position measurement mechanism. The arrangement of the lower electrode structure can avoid fragmenting of the member to be etched, and improve the product yield.