Electrode Shield Layout for RF Noise Isolation in Plasma Processing

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Solution Overview

Problem

Existing plasma processing apparatuses face issues with radio-frequency noise entering the heating element power source, leading to potential damage, malfunction, and reduced power efficiency due to the incomplete attenuation of radio-frequency noise by RF cut filters.

Innovation Solution

A plasma processing apparatus with a shield member made of conductive metal, such as tungsten or titanium, is disposed in the electrostatic chuck to maintain the same potential as the base, preventing radio-frequency power from reaching the heater electrode and improving plasma generation efficiency.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Object-affected harmful factors

If RF cut filters are used to attenuate radio-frequency noise, then some noise attenuation is achieved, but the noise is not completely prevented from entering the heater power supply

Engineering Contradiction:
Improveradio-frequency noise attenuationVSAvoidprotection against noise damage
Core Design Contradiction:
Object-affected harmful factorsVSReliability

Solution Approach 1:

A shield member is introduced as an intermediary component between the electrode portion and the heater power supply circuit. This shield member, disposed within the dielectric portion, intercepts and redirects radio-frequency noise before it can reach the heater power supply, providing complete protection that filters alone cannot achieve.

Inventive Principle:
Principle #24Intermediary (Mediator)

Solution Approach 2:

The shield member is configured to maintain the same potential as the base, creating an equipotential region that prevents radio-frequency noise from coupling into the heater electrode circuit. This equipotential design ensures that noise currents cannot flow into sensitive circuits.

Inventive Principle:
Principle #12Equipotentiality

2Reliability

If the shield member is disposed in the dielectric portion to overlap the electric circuit, then radio-frequency noise is completely blocked, but the device structure becomes more complex

Engineering Contradiction:
Improvecomplete noise preventionVSAvoidelectrode mechanism structure
Core Design Contradiction:
ReliabilityVSDevice complexity

Solution Approach 1:

The shield member is merged with the existing dielectric portion of the electrode mechanism, utilizing the same structural space and material composition. This integration approach adds the shielding function without requiring separate structural elements, thereby minimizing the increase in device complexity while achieving complete noise prevention.

Inventive Principle:
Principle #5Merging (Combining)

3Object-affected harmful factors

If RF cut filters are used, then some noise attenuation is achieved, but power efficiency is reduced

Engineering Contradiction:
Improvenoise attenuationVSAvoidpower efficiency
Core Design Contradiction:
Object-affected harmful factorsVSLoss of energy

Solution Approach 1:

The shield member acts as an intermediary that passively redirects radio-frequency noise through conductive paths without introducing resistive elements like filters. This approach blocks noise completely while maintaining optimal power transmission efficiency, as the shield directs currents along low-resistance pathways rather than forcing them through dissipative filter components.

Inventive Principle:
Principle #24Intermediary (Mediator)

Applied Scientific Principles

This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.

Function Achieved in This Case

Effectively prevents radio-frequency noise from entering the heater electrode, reducing the risk of damage and improving power efficiency by ensuring the radio-frequency power propagates through the shield member instead of the base, thereby enhancing the uniformity and efficiency of plasma processing.

Implementation Method 1

A plasma processing apparatus with a shield member made of conductive metal, such as tungsten or titanium, is disposed in the electrostatic chuck to maintain the same potential as the base

Methodology Applied
Scientific EffectElectrical Conductivity: Conduction (electrical)

Implementation Method 2

an electrode mechanism includes an electrode portion configured to be applied with radio-frequency power, a dielectric portion disposed to laminate with the electrode portion

Methodology Applied
Scientific EffectDielectric insulation: Dielectric

Data Source

PatentUS20230402263A1Plasma treatment device and electrode mechanism
Publication Date: 2023.12.14 TOKYO ELECTRON LTD
  • US20230402263A1 patent drawing
  • US20230402263A1 patent drawing
  • US20230402263A1 patent drawing

AI summary

A plasma processing apparatus includes: a processing chamber, and an electrode mechanism used for plasma processing. The electrode mechanism includes: an electrode portion configured to be applied with radio-frequency power, a dielectric portion disposed to laminate with the electrode portion, an electric circuit at least partially disposed in the dielectric portion, and a shield member disposed in the dielectric portion to overlap at least a part of the electric circuit in at least one of a plan view or a side view.