Electroless Plating Conductive Patterns Reactive Polymer

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Solution Overview

Problem

Current methods for forming conductive patterns in display devices, such as touch screens, are costly and inefficient due to the use of expensive materials like indium tin oxide (ITO) and complex vacuum deposition processes, and there is a need for a more cost-effective and reliable method to create thin, conductive lines for electromagnetic shielding and touch screen functionality.

Innovation Solution

The use of reactive polymers that can be crosslinked upon irradiation, allowing for the formation of conductive metal patterns through electroless plating, which reduces material costs and eliminates the need for high-vacuum processing by incorporating pendant sulfonic acid groups and crosslinking capabilities to facilitate the deposition of metals like silver or copper.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Reliability

If ITO coatings are used to create conductive patterns for touch screens, then electromagnetic shielding and touch detection functionality is achieved, but material cost increases due to expensive rare earth metal indium

Engineering Contradiction:
Improveelectromagnetic shielding and touch detection functionalityVSAvoidmaterial cost
Core Design Contradiction:
ReliabilityVSQuantity of substance

Solution Approach 1:

The patent replaces expensive ITO coatings with electrolessly plated metal patterns (silver, copper, or aluminum) that can be applied to disposable or reusable substrates. The metal patterns are deposited through electroless plating from aqueous solutions, eliminating the need for costly indium tin oxide while maintaining conductive functionality for electromagnetic shielding and touch detection

Inventive Principle:
Principle #27Cheap short-living objects (Disposable)

Solution Approach 2:

The patent changes the material parameter from ceramic oxide (ITO) to metallic elements (silver, copper, aluminum) and alters the deposition method from vacuum sputtering to electroless plating. This parameter change reduces material cost while achieving comparable or superior electrical conductivity and flexibility

Inventive Principle:
Principle #35Parameter changes

2Reliability

If ITO coatings are deposited using vacuum deposition methods, then conductive patterns are formed, but device complexity and manufacturing cost increase due to expensive vacuum equipment

Engineering Contradiction:
Improveconductive pattern formationVSAvoidvacuum deposition equipment
Core Design Contradiction:
ReliabilityVSDevice complexity

Solution Approach 1:

The patent substitutes the mechanical vacuum deposition system with a chemical electroless plating process. Instead of using vacuum pumps, sputtering guns, and complex vacuum chambers, the conductive metal patterns are formed through aqueous chemical reactions where metal ions are reduced and deposited onto the substrate surface, eliminating expensive vacuum equipment

Inventive Principle:
Principle #28Mechanics substitution (Replace mechanical system)

Solution Approach 2:

The patent uses aqueous-based electroless plating solutions to deposit metal patterns. The process involves immersing the substrate in liquid chemical baths containing metal salts and reducing agents, allowing metal deposition through hydraulic immersion rather than vacuum-based physical vapor deposition

Inventive Principle:
Principle #29Pneumatics and hydraulics

3Reliability

If ITO coatings are used in flexible display devices, then conductive functionality is provided, but the coating cannot be easily bent or flexed due to ceramic material rigidity

Engineering Contradiction:
Improveconductive functionalityVSAvoidflexibility
Core Design Contradiction:
ReliabilityVSStability of the object's composition

Solution Approach 1:

The patent changes the material phase from rigid ceramic oxide (ITO) to ductile metallic elements (silver, copper, aluminum). This parameter change in material state and bonding type provides superior flexibility and bendability while maintaining electrical conductivity, enabling use in flexible and wearable electronics

Inventive Principle:
Principle #35Parameter changes

4Manufacturing precision

If photolithography and mask materials are used to form conductive patterns, then precise pattern formation is achieved, but manufacturing complexity and cost increase

Engineering Contradiction:
Improvepattern formation accuracyVSAvoidmanufacturing process complexity
Core Design Contradiction:
Manufacturing precisionVSDevice complexity

Solution Approach 1:

The patent extracts and eliminates the photolithography and mask materials steps from the manufacturing process. Instead of using photoresist coatings, UV exposure, and mask alignment, the conductive metal patterns are directly formed through electroless plating on pre-patterned or directly written substrates, simplifying the manufacturing workflow

Inventive Principle:
Principle #2Taking out (Extraction)

Applied Scientific Principles

This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.

Function Achieved in This Case

This method enables the efficient formation of conductive metal patterns with reduced material costs and improved reliability, allowing for the creation of thin, conductive lines with high electrical conductivity, suitable for electromagnetic shielding and touch screen applications.

Implementation Method 1

reactive polymers that can be crosslinked upon irradiation, allowing for the formation of conductive metal patterns through electroless plating

Methodology Applied
Scientific EffectPhotopolymerization: Photopolymerisation

Implementation Method 2

electroless plating... to facilitate the deposition of metals like silver or copper

Methodology Applied
Scientific EffectReduction: Reduction

Data Source

PatentUS9081281B2Electroless plating method
Publication Date: 2015.07.14 EASTMAN KODAK CO
  • US9081281B2 patent drawing
  • US9081281B2 patent drawing
  • US9081281B2 patent drawing

AI summary

A conductive metal pattern is formed in a polymeric layer that has a polymer that comprises (1) pendant groups that are capable of providing pendant sulfonic acid groups upon exposure of the reactive polymer to radiation, and (2) pendant groups that are capable of reacting in the presence of the sulfonic acid groups to provide crosslinking. The polymeric layer is patternwise exposed to form non-exposed regions and exposed regions, which are contacted with a reducing agent to incorporate reducing agent therein. These exposed regions are then contacted with electroless seed metal ions to oxidize the reducing agent to form corresponding electroless seed metal nuclei that can be then electrolessly plated with a conductive metal.