Electrolytic Polishing Device Using Bipolar Induction Current

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Solution Overview

Problem

Traditional electrolytic polishing technologies face challenges in controlling current density distribution on workpieces, leading to uneven surface polishing during the processing of continuous products.

Innovation Solution

The electrolytic polishing device features an electrolytic bath with oppositely arranged anode and cathode plate assemblies separated by partition plates, allowing a non-contact polishing process that generates a bipolar induction current, improving surface smoothness and brightness by controlling electric field distribution.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Manufacturing precision

If traditional electrolytic polishing technology is used with electric connection manner, then polishing can be achieved, but current density distribution on continuous workpieces cannot be controlled, resulting in poor surface uniformity

Engineering Contradiction:
Improvesurface uniformityVSAvoidcurrent density control
Core Design Contradiction:
Manufacturing precisionVSEase of operation

Solution Approach 1:

The patent replaces the traditional mechanical contact-based electric connection manner with a non-contact electromagnetic induction system. The first and second induction electrodes generate a magnetic field that induces current in the conductive workpiece without physical contact, enabling precise control of current density distribution across the workpiece surface while maintaining polishing effectiveness.

Inventive Principle:
Principle #28Mechanics substitution (Replace mechanical system)

Solution Approach 2:

The patent introduces a new dimensional approach by using electromagnetic fields in the spatial domain rather than direct electrical connections. The induction electrodes are positioned above and below the workpiece, creating a three-dimensional electromagnetic field distribution that enables uniform current density control across the entire workpiece surface during continuous processing.

Inventive Principle:
Principle #17Another dimension (Dimensionality change)

2Productivity

If continuous products are treated with traditional electrolytic polishing, then production efficiency is maintained, but surface uniformity deteriorates due to uncontrollable current density distribution

Engineering Contradiction:
Improvecontinuous processing capabilityVSAvoidsurface uniformity
Core Design Contradiction:
ProductivityVSManufacturing precision

Solution Approach 1:

The non-contact electromagnetic induction system allows continuous workpieces to pass through the polishing zone without interruption or stopping for repositioning. The magnetic field follows the workpiece through the electrolyte, maintaining consistent current density distribution across the entire surface area, thereby achieving both high productivity and uniform surface quality in continuous processing.

Inventive Principle:
Principle #28Mechanics substitution (Replace mechanical system)

3Manufacturing precision

If non-contact polishing with bipolar induction current is used, then surface smoothness and uniformity are improved, but device complexity increases due to additional electrode assemblies and partition plates

Engineering Contradiction:
Improvesurface smoothnessVSAvoidelectrode assembly structure
Core Design Contradiction:
Manufacturing precisionVSDevice complexity

Solution Approach 1:

The polishing device is divided into distinct functional segments: the first induction electrode assembly, the partition plate, the second induction electrode assembly, and the electrolyte circulation system. This segmentation allows each component to be independently optimized and maintained, reducing overall system complexity despite the advanced functionality. The partition plate specifically separates the magnetic field zones to prevent short-circuiting while maintaining structural simplicity.

Inventive Principle:
Principle #1Segmentation

4Manufacturing precision

If traditional electrolytic polishing is used, then polishing action is achieved, but oxide generation on workpiece surface increases, requiring additional cleaning steps

Engineering Contradiction:
Improvepolishing effectVSAvoidoxide generation
Core Design Contradiction:
Manufacturing precisionVSObject-generated harmful factors

Solution Approach 1:

The patent inverts the traditional electrolytic polishing approach by using electromagnetic induction to generate current in the workpiece rather than applying current through direct electrical contact. This reversal of the current generation method reduces oxidative reactions on the workpiece surface while maintaining the electrolytic dissolution effect needed for polishing, thereby reducing oxide generation and the need for subsequent cleaning steps.

Inventive Principle:
Principle #13The other way round (Inversion)

Applied Scientific Principles

This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.

Function Achieved in This Case

This approach enhances the polishing effect and uniformity of workpieces by reducing oxide generation and achieving a smooth, bright surface with reduced surface roughness, facilitating subsequent processes.

Implementation Method 1

a bipolar induction current is generated on a workpiece

Methodology Applied
Scientific EffectElectromagnetic induction: Electromagnetic Induction

Implementation Method 2

selectively dissolving micro-protrusions on an anode by using an electrochemical dissolution phenomenon generated by the anode in an electrolytic bath

Methodology Applied
Scientific EffectElectrochemical dissolution: Electrolysis

Data Source

PatentUS20240240351A1Electrolytic polishing device, system and method
Publication Date: 2024.07.18 TECH (CHINA HK) LTD
  • US20240240351A1 patent drawing
  • US20240240351A1 patent drawing
  • US20240240351A1 patent drawing

AI summary

An electrolytic polishing device is provided and includes an electrolytic bath used for accommodating an electrolyte. A polishing channel for a to-be-polished workpiece to pass through is provided in the electrolytic bath. An anode plate assembly and a cathode plate assembly are arranged in the electrolytic bath along the extending direction of the polishing channel and are separated by a partition plate assembly. The anode plate assembly includes two anode plates, which are oppositely arranged and respectively located on two sides of the polishing channel. The cathode plate assembly includes two cathode plates, which are oppositely arranged and respectively located on two sides of the polishing channel. The partition plate assembly includes two partition plates, which are oppositely arranged and respectively located on two sides of the polishing channel. The anode plate assembly and the cathode plate assembly can be connected with a power supply.