Electromagnet Array for Vapor Deposition Mask Adsorption
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Solution Overview
Problem
Existing vapor deposition devices with magnetic devices cannot adjust magnetic field intensity and pole arrangement conveniently, making it difficult to adsorb metal masks of varying precision and specifications without replacing the magnetic device, and they face issues with magnetic hysteresis that can damage the masks during demagnetization.
Innovation Solution
A magnetic device with a control module that adjusts the magnetic field intensity and pole arrangement by controlling the power supply to electromagnets, using direct and alternating currents to adsorb and demagnetize the metal mask, preventing winding and hysteresis effects, and allowing for different current directions and sizes to accommodate various mask specifications.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Adaptability or versatility
If permanent magnets are used in the magnetic device, then the magnetic pole arrangement is fixed and simple in structure, but the magnetic field intensity and pole arrangement cannot be changed conveniently when different metal masks are used
Solution Approach 1:
The patent replaces fixed permanent magnets with electromagnets that can dynamically adjust their magnetic pole arrangement and field intensity. The control module enables real-time reconfiguration of magnetic poles to match different metal mask requirements, transforming a static system into a dynamic one that adapts to varying operational conditions without increasing structural complexity.
Solution Approach 2:
The patent changes the magnetic field parameters (intensity and pole arrangement) by controlling the current supplied to electromagnets. The control module adjusts electrical parameters to achieve different magnetic configurations, allowing the same device to handle various metal mask specifications through parameter modulation rather than physical reconfiguration.
2Object-affected harmful factors
If the distance between the magnetic device and the metal mask is increased to reduce magnetic hysteresis damage, then the magnetic hysteresis effect is reduced, but the adsorption force decreases and may not be sufficient to hold the mask
Solution Approach 1:
The patent employs periodic alternating current to the electromagnets during the demagnetization phase, creating a periodic magnetic field that effectively reduces magnetic hysteresis. This periodic action allows the system to maintain strong adsorption force during the deposition process while systematically eliminating residual magnetism afterward, preventing both hysteresis damage and adsorption failure.
Solution Approach 2:
The patent dynamically adjusts the magnetic field characteristics during different operational phases. During deposition, the magnetic field is optimized for maximum adsorption force; after deposition, the field is transformed through alternating current to reduce hysteresis. This dynamic control allows the system to overcome the trade-off between adsorption force and hysteresis damage.
3Force
If direct current is used to generate magnetic field for adsorption, then the magnetic field is stable and strong for holding the mask, but magnetic hysteresis occurs during demagnetization that can damage the mask
Solution Approach 1:
The patent switches from direct current to alternating current after the adsorption phase is complete. The alternating current creates a periodically reversing magnetic field that systematically demagnetizes the metal mask, eliminating the hysteresis effect that would otherwise cause damage. This temporal separation of functions (DC for adsorption, AC for demagnetization) resolves the contradiction between maintaining strong adsorption and preventing hysteresis damage.
Solution Approach 2:
The patent maintains continuous magnetic field control throughout the entire process. The electromagnets remain active during deposition to ensure continuous adsorption, then transition to alternating current mode for continuous demagnetization afterward. This continuous control eliminates the harmful hysteresis effect that would occur with abrupt power interruption, while maintaining the beneficial adsorption force during the critical deposition phase.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
Enables flexible and precise adsorption of metal masks during vapor deposition and prevents damage from magnetic hysteresis by dynamically controlling the magnetic field, allowing for efficient and precise processing of different mask specifications without the need for device replacement.
Implementation Method 1
the power supply module is configured to supply a direct current to all or some of the plurality of electromagnets
Implementation Method 2
an electromagnet array including a plurality of electromagnets; each of the electromagnets being inserted in the metal plate
Implementation Method 3
the power supply module to repeatedly supply an alternating current to all or some of the plurality of electromagnets until the plurality of electromagnets are demagnetized
Implementation Method 4
They face issues with magnetic hysteresis that can damage the masks during demagnetization
Data Source
Figure 1~4
AI summary
The present disclosure provides a magnetic device and a vapor deposition device. The magnetic device is configured to adsorb a metal mask in the vapor deposition device, including: a metal plate; an electromagnet array including a plurality of electromagnets; each of the electromagnets being inserted in the metal plate; a power supply module configured to supply a current; a control module configured to, when adsorbing the metal mask during a vapor deposition process, control the power supply module to supply a direct current to all or some of the plurality of electromagnets and control a direction and a size of the direct current by sending a first control signal to the power supply module.