Electromagnet Magnetron Layout for Adjustable PVD Field Control
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Solution Overview
Problem
Existing physical vapor deposition (PVD) technologies using magnetrons with permanent magnets are inflexible and can generate unwanted magnetic fields that cross-influence nearby processes, requiring complex physical adjustments and lengthy redesign times between different PVD processes.
Innovation Solution
A magnetron design featuring a base with a plurality of electromagnets between a magnetic conductive plate, allowing for independent control of electromagnet polarity and current, enabling the generation of adjustable magnetic fields of varying shapes and strengths, and the use of removable magnetic conductive segments to enhance field configuration.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Adaptability or versatility
If permanent magnets are used in magnetron design, then magnetic field is generated for PVD process, but magnetic field cannot be adjusted and cross-influences nearby processes
Solution Approach 1:
The patent replaces static permanent magnets with dynamic electromagnets that can be independently controlled. The electromagnets allow real-time adjustment of magnetic field strength and polarity through electrical current control, enabling adaptation to different PVD processes without physical reconfiguration. This dynamic control system resolves the contradiction by providing field adjustability while eliminating mechanical adjustment complexity.
Solution Approach 2:
The patent changes the fundamental parameter control method from fixed magnetic properties of permanent magnets to variable electrical parameters of electromagnets. By controlling current magnitude and polarity to electromagnets, the magnetic field characteristics can be precisely adjusted for different deposition processes, achieving adaptability without physical modifications to the magnetron structure.
2Productivity
If permanent magnets are used in magnetron, then PVD process can be performed, but redesign time between processes is lengthy
Solution Approach 1:
The electromagnet system enables rapid switching between different PVD processes by simply changing electrical control parameters rather than requiring physical redesign or reconfiguration of magnetic components. This dynamic electrical control dramatically reduces process switching time and eliminates lengthy redesign periods between different deposition processes.
Solution Approach 2:
The patent replaces the mechanical/physical adjustment system of permanent magnets with an electrical control system using electromagnets. This substitution allows process parameters to be changed through electrical signals rather than physical modifications, significantly reducing the time required for redesign and reconfiguration between different PVD processes.
3Manufacturing precision
If electromagnets with independent control are used, then magnetic field can be precisely adjusted, but device complexity increases
Solution Approach 1:
The magnetron is divided into multiple independently controllable electromagnet segments rather than using a single permanent magnet assembly. Each electromagnet can be controlled individually, allowing precise local adjustment of magnetic field distribution across the target surface. This segmentation enables superior deposition uniformity control while the modular structure manages complexity through standardized reusable components.
Solution Approach 2:
The electromagnet array serves multiple functions: generating the primary magnetic field for PVD, adjusting field distribution for uniformity control, and enabling rapid process switching. This multi-functionality consolidates what would otherwise require separate systems, managing overall device complexity while achieving precise manufacturing control through a single integrated system.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This design allows for precise control of deposition rates and uniformity during PVD processes, reduces redesign time between processes, and extends target material lifetime by modifying magnetic fields without physical adjustments, improving process efficiency and flexibility.
Implementation Method 1
A magnetron design featuring a base with a plurality of electromagnets between a magnetic conductive plate, allowing for independent control of electromagnet polarity and current, enabling the generation of adjustable magnetic fields
Implementation Method 2
removable magnetic conductive segments to enhance field configuration
Implementation Method 3
The target material is bombarded by ions originating from a process gas having relatively heavy atoms. When the ions strike the target material, atoms or molecules are ejected from the target material
Implementation Method 4
Physical vapor deposition (PVD) is a target material deposition process performed in a deposition chamber. The ejected atoms or molecules accumulate on the surface of the other material as a film or layer(s) of the target material
Data Source
AI summary
An apparatus and method for physical vapor deposition includes a magnetron having a plurality of electromagnets disposed between a base and a magnetic conductive plate. The magnetron includes a plurality of individually controlled electromagnets between a base and an electromagnetic plate. The magnetron controls the polarity and strength of current supplied to the respective electromagnets to generate magnetic fields that confine electrons to areas near a target material within the deposition chamber.