Electron Beam Manipulator Layout for Off-Axis Aberration Correction
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Solution Overview
Problem
Existing charged particle beam inspection tools suffer from aberrations in multi-beam paths that lead to blurry and out-of-focus images due to the need for stronger manipulation of electron beams off the central axis, degrading image quality and throughput in semiconductor manufacturing.
Innovation Solution
A charged particle beam illumination apparatus with a multi-beam electron beam manipulator that includes a substrate with electrodes forming part of the interconnecting surface, configured to manipulate electron beams and compensate for aberrations using micro-deflectors, micro-lenses, and astigmatism compensators to maintain image clarity and throughput.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Manufacturing precision
If conventional charged particle beam illumination systems are used, then the system can operate with standard components, but aberrations occur that degrade image quality particularly for off-axis sub-beams
Solution Approach 1:
The illumination system is divided into multiple sub-beams that can be independently manipulated. Each sub-beam is processed through individual electrostatic deflectors and lenses, allowing separate correction of aberrations for different beam regions. This segmentation enables precise control of off-axis sub-beams without affecting on-axis beams, directly resolving the aberration issue while maintaining manufacturing feasibility.
Solution Approach 2:
Electrostatic deflectors and electrostatic lenses are introduced as intermediary components between the electron source and the substrate. These intermediaries actively manipulate the charged particle beams to correct trajectory deviations and focus issues. The electrostatic fields generated by these components serve as mediators that compensate for optical aberrations, particularly for off-axis sub-beams, thereby improving image quality without requiring complete system redesign.
2Manufacturing precision
If multiple beam manipulators are stacked to improve beam control, then beam alignment improves, but the device complexity increases
Solution Approach 1:
Multiple beam manipulator functions are merged into integrated electrostatic component assemblies. The electrostatic deflectors and lenses are combined in stacked configurations where each layer performs specific manipulation tasks. This merging approach achieves precise beam alignment through coordinated action of multiple components while reducing overall structural complexity compared to separate manipulator systems. The integrated design allows compact arrangement and simplified mounting procedures.
Solution Approach 2:
The beam manipulation is extended from two-dimensional planar control to three-dimensional spatial control by stacking manipulator layers at different heights and orientations. This dimensional extension enables comprehensive control of beam trajectories in multiple directions simultaneously. The stacked configuration adds vertical dimension to the manipulation capability, achieving superior beam alignment without requiring overly complex lateral mechanisms.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The solution enhances image quality and throughput by reducing aberrations, ensuring high-resolution and accurate inspection of semiconductor structures, thereby improving yield and reducing the risk of false defect detection.
Implementation Method 1
The body comprises an electrode forming at least part of the interconnecting surface between the first surface and the second surface
Data Source
AI summary
An improved electron beam manipulator for manipulating an electron beam in an electron projection system and a method for manufacturing thereof are disclosed. The electron beam manipulator comprises a body having a first surface and a second surface opposing to the first surface and an interconnecting surface extending between the first surface and the second surface and forming an aperture through the body. The body comprises an electrode forming at least part of the interconnecting surface between the first surface and the second surface.