Electron Beam Aligner Using Optical Image Detection
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Solution Overview
Problem
The existing methods for aligning electron beams in electron beam irradiation apparatuses require significant adjustment costs, time, and effort due to the need for multiple ammeters connected to each electrode in deflectors, making the process cumbersome and inefficient.
Innovation Solution
An electron beam alignment method that involves detecting the image of the electron beam by applying test and reference voltages to the electrodes of a deflector, determining position shifts, and adjusting the aligner to cancel these shifts, allowing for efficient alignment without the need for extensive current measurements.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Measurement precision
If ammeters are connected to each electrode in the deflector to measure current for alignment, then measurement precision is improved, but device complexity and adjustment cost increase
Solution Approach 1:
The patent introduces a fluorescent screen as an intermediary element that converts electron beam position information into visible light patterns. This mediator allows the alignment system to detect beam position optically rather than requiring direct electrical measurement at each electrode, thereby reducing device complexity while maintaining measurement precision
Solution Approach 2:
The patent replaces the electrical measurement system (ammeters connected to each electrode) with an optical detection system using a fluorescent screen and camera. This substitution eliminates the need for multiple current measurement devices and their associated wiring, significantly reducing system complexity while achieving the same alignment measurement objective
2Measurement precision
If ammeters are connected to each electrode to perform alignment measurements, then measurement accuracy is improved, but loss of time and effort increases
Solution Approach 1:
The patent creates a visual copy of the electron beam position information on the fluorescent screen, which can be captured by a camera and processed computationally. This copying approach allows for rapid acquisition and analysis of alignment data without the time-consuming process of manually connecting and reading multiple ammeters
Solution Approach 2:
The system enables automatic alignment by having the computer automatically analyze the captured image of the fluorescent screen pattern and calculate the required adjustments. This self-service capability eliminates manual measurement and calculation steps, dramatically reducing the time and effort required for alignment while maintaining high measurement accuracy
3Measurement precision
If multiple ammeters are used to measure current at each electrode, then alignment precision is improved, but ease of operation deteriorates
Solution Approach 1:
The patent replaces the complex electrical measurement operation (connecting multiple ammeters to each electrode) with a simple optical observation operation (viewing the fluorescent screen pattern). This substitution makes the alignment process much easier to operate while maintaining measurement precision through the optical detection system
Solution Approach 2:
The system creates a visual copy of the beam position information that can be easily captured and analyzed by computer software. This copying mechanism transforms a complex multi-electrode measurement task into a simple image acquisition and processing operation, greatly improving ease of operation
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This method simplifies the electron beam alignment process, reducing the time and effort required for adjustments and enabling easier operation of electron beam irradiation apparatuses by directly detecting and correcting position shifts based on image analysis.
Implementation Method 1
a deflector 3 and configured to deflect the electron beam after passing through the aligner
Implementation Method 2
an aligner 2 configured to perform an alignment of an electron beam by deflecting the electron beam
Data Source
AI summary
Provided is an electron beam irradiation apparatus including: an aligner configured to perform an alignment of an electron beam by deflecting the electron beam; a deflector having a plurality of electrodes and configured to deflect the electron beam after passing through the aligner; and an adjuster configured to adjust deflection caused by the aligner, wherein the adjuster is configured to perform, on each of the plurality of electrodes, detecting an image of the electron beam by applying a test voltage to one of the plurality of electrodes and applying a reference voltage to the other electrodes, determine a position shift of the electron beam based on each position of the image of the electron beam corresponding to each electrode, and adjust deflection of the aligner so as to cancel the position shift of the electron beam.