Electron Beam Aperture Alignment for Astigmatic Semiconductor Imaging
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Solution Overview
Problem
Manual alignment of the aperture in semiconductor manufacturing devices using electron beams is time-consuming and inefficient, especially when astigmatism occurs, making it difficult to accurately align the aperture with the electron beam axis.
Innovation Solution
A semiconductor manufacturing device with a controller that acquires original images at varying working distances, calculates motion vectors from position vectors, and adjusts the aperture position using a compensation vector to automate the alignment process, ensuring accurate alignment regardless of astigmatism.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Measurement precision
If manual adjustment of aperture position is used, then alignment accuracy can be achieved, but process time increases significantly
Solution Approach 1:
The system performs self-alignment by automatically calculating the aperture position based on image data and motion vectors without requiring manual intervention. The controller computes the compensation vector and adjusts the aperture position autonomously, enabling the device to align itself efficiently.
Solution Approach 2:
The patent replaces manual mechanical adjustment with an automated computational system. Instead of relying on operators to physically adjust the aperture, the system uses image processing, motion vector calculation, and automated control mechanisms to achieve precise alignment, thereby eliminating time-consuming manual operations.
2Productivity
If automated alignment is implemented, then process efficiency improves, but system complexity increases
Solution Approach 1:
The controller serves multiple functions: acquiring images, calculating motion vectors, determining compensation vectors, and controlling aperture positioning. By consolidating these functions into a single control unit, the system achieves automated alignment without proportionally increasing overall system complexity.
Solution Approach 2:
The patent introduces intermediate computational steps (motion vector calculation, compensation vector determination) that bridge the gap between image acquisition and aperture positioning. These intermediaries enable automated control while maintaining a manageable system architecture by breaking down the complex alignment task into sequential, manageable operations.
3Measurement precision
If aperture position is adjusted frequently for working distance changes, then alignment accuracy is maintained, but operation time increases
Solution Approach 1:
The system calculates the compensation vector in advance based on the relationship between working distance changes and aperture position requirements. By pre-computing the necessary adjustments and executing them automatically, the system maintains alignment accuracy without requiring lengthy manual adjustment operations for each working distance change.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The automated alignment significantly improves process efficiency by reducing alignment time and increasing accuracy, allowing for quicker and more precise image capture of target regions, even in devices with astigmatism.
Implementation Method 1
an electron beam emitted from an electron beam source passes through an aperture, a condenser lens formed by an electromagnetic field, or the like, to be incident on a subject
Data Source
AI summary
A semiconductor manufacturing device includes an electron beam source emitting; a plurality of condenser lenses disposed between a stage on which an object including structures is seated and the electron beam source; an objective lens disposed between the plurality of condenser lenses and the stage; an aperture disposed between the plurality of condenser lenses; and a controller configured to acquire a plurality of original images according to a working distance between the objective lens and the object, acquire a pattern image indicating the structures from the plurality of original images, a plurality of kernel images indicating distribution of an electron beam on the object, and a plurality of position vectors indicating a relative position of the structures in the plurality of kernel images, and adjust a position of the aperture based on a motion vector indicating movement of the plurality of position vectors according to the working distance.