Electron Beam Deflector Layout for Orthogonal Welding Access
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Solution Overview
Problem
Existing electron beam welding technologies face challenges in achieving high precision and low heat input welds in mass production environments, particularly when welding large areas with complex components, due to the need for large tooling that obstructs the electron beam path and complicates positional alignment, increasing cycle times.
Innovation Solution
An electron beam deflector comprising a planar body with deflector elements that modify the beam's direction, allowing localized deflection within a vacuum chamber, ensuring the beam is directed orthogonally to the weld site, even when obstructed by tooling, using electromagnetic coils or other deflectors.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Strength
If large tooling is used to clamp components, then mechanical strength for clamping is improved, but the electron beam path is obstructed and positional alignment becomes complicated
Solution Approach 1:
The patent introduces a new spatial dimension by placing deflector elements within the tooling structure itself, allowing the electron beam to be redirected through three-dimensional space around and through the tooling. This enables the beam to reach weld sites on clamped components without requiring the tooling to be moved or reconfigured, thus maintaining strong clamping while simplifying alignment procedures.
2Ease of operation
If the electron gun is moved further from the part, then beam access is improved, but the vacuum chamber size must increase and cycle time increases
Solution Approach 1:
The patent introduces deflector elements as intermediary components that mediate between the fixed electron gun and the workpiece. These deflectors, positioned within the vacuum chamber near the workpiece, redirect the electron beam locally to access weld sites that would otherwise be blocked by tooling. This eliminates the need to move the electron gun or expand the vacuum chamber, thereby maintaining short cycle times while improving beam access.
3Productivity
If rapid beam deflection is used for mass production, then productivity is improved, but precision positioning becomes more difficult when obstructed by tooling
Solution Approach 1:
The patent segments the beam control function by introducing separate deflector elements positioned at multiple locations within the vacuum chamber. Each deflector element can independently adjust the beam direction to specific weld sites, allowing rapid repositioning without compromising precision. This segmented approach enables high-speed beam deflection while maintaining accurate positioning even when tooling obstructs direct access to weld areas.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
Enables high-quality welds over large areas with reduced cycle times by minimizing beam obstruction and improving positional accuracy, allowing for rapid distribution of the electron beam across multiple weld sites without the need for large vacuum chambers.
Implementation Method 1
at least one deflector element is disposed within the at least one channel and the at least one deflector element is configured to modify the direction of travel of an electron beam
Data Source
AI summary
There is provided an electron beam deflector (32) for use in electron beam welding, the deflector (32) comprising a planar body (32) defining at least one channel (36) enabling passage of an electron beam (14) to a weld site, wherein at least one deflector element (44) in the form of an electromagnetic coil is disposed within the at least one channel (36) and the electromagnetic coil (44) is configured to modify the direction of travel of an electron beam so as to deflect the electron beam (14) to be incident substantially orthogonal to a weld site of a workpiece. The planar body (32) comprises a separate base portion (40) and lid portion (42).