Electron Beam Deflector Electrode Shielding
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Solution Overview
Problem
Existing electron beam lithography systems face challenges in accurately controlling electron beams due to cross-talk issues between electrodes and varying impedance caused by unfixed earth wires, which degrade the precision of mask processing in semiconductor devices.
Innovation Solution
A deflector system with symmetrically arranged control electrodes and molding substrates featuring fixed earth electrodes and signal wires, ensuring constant impedance and minimizing cross-talk, is introduced. This configuration includes integrally formed earth electrodes between adjacent control electrodes to stabilize the electron beam's trajectory.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Ease of manufacture
If earth wires are connected to outer peripheral side of electrodes with unfixed routes, then ease of manufacture is improved, but impedance varies causing deflection potential fluctuation that degrades electron beam control accuracy
Solution Approach 1:
The patent applies equipotentiality by connecting earth wires to electrodes through molding substrates that maintain constant potential distribution. The substrates are designed with specific conductivity and geometry to ensure that the potential at each electrode connection point remains stable regardless of external conditions, thereby eliminating impedance variations and potential fluctuations while preserving manufacturing simplicity.
2Measurement precision
If deflection potential is applied to predetermined electrode, then electron beam position control is achieved, but micro potential is generated in adjacent electrodes causing cross talk
Solution Approach 1:
The patent introduces molding substrates as intermediary elements between adjacent electrodes. These substrates act as potential buffers that isolate the electrical fields of neighboring electrodes, preventing micro potential generation in adjacent electrodes when deflection potential is applied. This intermediary structure effectively blocks cross-talk while preserving the primary electron beam control function.
3Measurement precision
If multiple individually insulated trapezoidal bulk electrodes are arranged symmetrically, then electron beam position and trajectory control is improved, but cross talk occurs between adjacent electrodes
Solution Approach 1:
The patent applies segmentation by dividing the electrode structure into electrically isolated segments through molding substrates. Each electrode is segmented from its neighbors by these substrates, which create electrical boundaries that prevent cross-talk while maintaining the symmetrical arrangement necessary for precise electron beam control. This segmented design allows independent potential control of each electrode without interference.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The solution effectively suppresses cross-talk and enhances the accuracy of electron beam control, maintaining high precision in mask processing by stabilizing the impedance and reducing unwanted potential fluctuations.
Implementation Method 1
An electrostatic deflector is typically used for controlling an electron beam
Implementation Method 2
Jpn. Pat. Appln. Laid-Open Publication No. 2002-198294 and other patent documents propose techniques of arranging an earth electrode between adjacent electrodes
Data Source
AI summary
A deflector for an equipment of electron beam lithography, the deflector including a plurality of control electrodes arranged symmetrically relative to the center axis of an irradiated electron beam, the electrodes configured to control the electron beam by applying voltages respectively, a plurality of molding substrates arranged symmetrically relative to the center axis of the electron beam configured to face outer peripheral surfaces of the plurality of control electrodes and a plurality of earth electrodes arranged respectively at the plurality of molding substrates. The deflector can suppress generation of cross talks with an improved accuracy of controlling an electron beam.