Electron Beam Drift Compensation for Radiation-Sensitive Specimens

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Solution Overview

Problem

High-resolution electron microscopy is hindered by image drift, which causes blurring, and existing methods to compensate for drift require high radiation doses that damage radiation-sensitive specimens like biological molecules, rendering subsequent images unusable.

Innovation Solution

A drift-compensation algorithm that estimates drift without exposing radiation-sensitive specimens to high radiation doses by using a fast controllable beam deflector and a drift-estimation algorithm that locks on drift-induced motion, allowing imaging without initial high-dose exposure.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Measurement precision

If a drift-estimation algorithm is used to obtain accurate drift estimate before counter-acting drift-induced motion, then image quality is improved, but radiation dose to the specimen increases causing irreversible damage

Engineering Contradiction:
Improvedrift estimate accuracyVSAvoidradiation dose damage
Core Design Contradiction:
Measurement precisionVSObject-affected harmful factors

Solution Approach 1:

The patent divides the sample into different portions: a first portion used for drift estimation and a second portion (POI) used for high-resolution imaging. The drift-estimation algorithm processes image frames from the first portion to compute drift parameters, which are then applied to compensate motion during imaging of the radiation-sensitive POI. This segmentation allows drift compensation without exposing the sensitive specimen to high radiation doses.

Inventive Principle:
Principle #1Segmentation

Solution Approach 2:

The patent introduces an intermediary region (the first portion of the sample) that serves as a mediator between the drift compensation need and the radiation-sensitive POI. This intermediary portion absorbs the radiation dose required for accurate drift measurement, while the POI receives minimal radiation exposure. The drift information obtained from the intermediary is then used to protect the POI from motion blur.

Inventive Principle:
Principle #24Intermediary (Mediator)

2Manufacturing precision

If stage actuation is used to move the sample holder to counteract drift-induced motion, then image sharpness is improved, but system complexity increases

Engineering Contradiction:
Improveimage sharpnessVSAvoidstage control system
Core Design Contradiction:
Manufacturing precisionVSDevice complexity

Solution Approach 1:

The patent replaces the mechanical stage actuation system with an electronic beam deflection system for drift compensation. Instead of physically moving the sample holder to counteract drift, the patent uses a beam deflector to dynamically adjust the electron beam position, effectively compensating for drift-induced motion through electronic control. This substitution reduces mechanical complexity while achieving the same image sharpness improvement.

Inventive Principle:
Principle #28Mechanics substitution (Replace mechanical system)

3Measurement precision

If active optical control of electron-beam parameters is used to counteract drift, then image quality is improved, but control system complexity increases

Engineering Contradiction:
Improveimage qualityVSAvoidoptical control system
Core Design Contradiction:
Measurement precisionVSDevice complexity

Solution Approach 1:

The patent changes the parameters of the electron beam (position, angle) through the beam deflector to counteract drift-induced motion. By dynamically adjusting beam parameters in response to measured drift, the system achieves image stabilization without requiring complex mechanical stage control or sophisticated optical element manipulation. The parameter changes are computed from drift estimation and applied through relatively simple beam deflection control.

Inventive Principle:
Principle #35Parameter changes

Applied Scientific Principles

This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.

Function Achieved in This Case

Enables high-resolution imaging of radiation-sensitive specimens by minimizing specimen damage, achieving accurate drift compensation without initial high-dose radiation exposure.

Implementation Method 1

a fast controllable beam deflector and employs a drift-estimation algorithm that locks on the drift-induced motion when the beam deflector places the electron beam into a first position on the sample

Methodology Applied
Scientific EffectElectron beam deflection: Lorentz Force

Implementation Method 2

a charged particle beam column configured to direct a beam of charged particles to a sample; a detector configured to detect a response of the sample to the beam of charged particles

Methodology Applied
Scientific EffectElectron beam interaction with matter: Electron Beam

Data Source

PatentEP4657489A2Drift compensation for radiation-sensitive specimens
Publication Date: 2025.12.03 FEI CO
  • EP4657489A2 patent drawingFigure 1
  • EP4657489A2 patent drawingFigure 2
  • EP4657489A2 patent drawingFigure 3

AI summary

In one example, a method performed via a computing device for providing support to a charged particle beam system includes computing a drift estimate based at least in part on a first set of image frames acquired with a charged particle beam column and a detector from a first portion of a sample. The method also includes configuring the charged particle beam column and the detector to acquire a second set of image frames from a second portion of the sample. The method further includes performing drift compensation during acquisition of the second set of image frames based at least in part on the drift estimate.