Electron Beam EUV Light Source with Metal Droplet Ionization
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Solution Overview
Problem
Current extreme ultraviolet (EUV) lithography equipment is expensive, complex, and difficult to maintain due to its large size and high-power laser-based design, which generates significant debris.
Innovation Solution
A compact EUV light source device utilizing a low-power electron beam and a metal droplet to generate plasma, with a simple internal structure and a separate anode electrode, allowing for efficient light output and reduced maintenance needs.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Power
If high-power laser-based extreme ultraviolet lithography equipment is used, then extreme ultraviolet light output is achieved, but the device becomes expensive, complex, and generates significant debris
Solution Approach 1:
The patent replaces the laser-based system with an electron beam-based system. Specifically, it uses an electron beam emission unit with carbon-based emitters to generate electron beams that ionize metal droplets to produce extreme ultraviolet light, eliminating the need for high-power lasers and their associated complex optical systems
Solution Approach 2:
The patent changes the fundamental operating parameters by using low-power electron beams instead of high-power lasers. The electron beam system operates at lower power levels while still achieving the required extreme ultraviolet light output through the ionization of metal droplets, thereby reducing debris generation and simplifying the overall system
2Power
If high-power laser-based extreme ultraviolet lithography equipment is used, then extreme ultraviolet light output is achieved, but manufacturing cost increases
Solution Approach 1:
The patent employs disposable carbon-based emitters that can be easily replaced. These emitters are consumable components that degrade over time but can be quickly swapped out, eliminating the need for expensive laser maintenance and reducing overall manufacturing and operational costs
Solution Approach 2:
By replacing the expensive laser-based system with a simpler electron beam system using readily available carbon materials and metal droplets, the patent significantly reduces manufacturing costs while maintaining extreme ultraviolet light output capability
3Power
If high-power laser-based extreme ultraviolet lithography equipment is used, then extreme ultraviolet light output is achieved, but maintenance difficulty increases due to debris
Solution Approach 1:
The patent converts the potential harm of debris generation into a benefit by using a system that inherently generates minimal debris. The low-power electron beam ionization of metal droplets produces clean plasma without the significant debris generation associated with high-power lasers, making maintenance much easier
Solution Approach 2:
The chamber design allows for easy access and maintenance of components. The simple structure with removable electron beam emission units and droplet injection systems enables operators to perform routine maintenance and replacements without requiring complex disassembly or specialized service procedures
4Device complexity
If a single electron beam emission unit is used, then device simplicity is maintained, but light output efficiency is limited
Solution Approach 1:
The patent divides the electron beam emission system into multiple independent emission units, each with its own cathode and emitters. These segmented units can be arranged around the chamber and independently controlled, allowing the system to scale light output by activating more segments while maintaining the simplicity of individual unit design
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The solution achieves a simple inner structure, compact size, and low manufacturing costs, while reducing debris and maintenance challenges, and improving EUV light output through the use of multiple electron beams.
Implementation Method 1
the metal droplet is ionized by the electron beam proceeding toward the anode electrode, thereby generating plasma, and extreme ultraviolet is generated from the plasma
Implementation Method 2
the metal droplet is ionized by the electron beam proceeding toward the anode electrode, thereby generating plasma
Implementation Method 3
an electron beam emission unit including a cathode electrode and a plurality of emitters, each of which contains a carbon-based material and which are arranged over the cathode electrode in such a manner as to be spaced apart from each other, the electron beam emission unit generating an electron beam within the chamber
Data Source
AI summary
There is provided a light source device for outputting an extreme ultraviolet light source based on an electron beam and a metal droplet, comprising: a chamber; an electron beam emission unit including a cathode electrode and a plurality of emitters, each of which contains a carbon-based material and which are arranged over the cathode electrode in such a manner as to be spaced apart from each other, the electron beam emission unit generating an electron beam within the chamber; an anode electrode positioned within the chamber, but in a manner that is spaced apart from the electron beam emission unit; and a droplet generation device injecting a metal droplet into a space between the electron beam emission unit and the anode electrode within the chamber, wherein, within the chamber, the metal droplet is ionized by the electron beam proceeding toward the anode electrode, thereby generating plasma, and extreme ultraviolet is generated from the plasma.