Electron Beam Irradiation Apparatus Transmitted Light Shielding
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Solution Overview
Problem
In multi-electron beam writing technology, the exposure of resist on target objects to transmitted light from the photoelectric surface affects writing accuracy due to the thin film thickness and light passing through, which is not effectively shielded by existing systems.
Innovation Solution
An electron beam irradiation apparatus and method that includes a photoelectric surface receiving excitation light to generate electron beams, a blanking aperture array mechanism, a limit aperture substrate, and an adjustment mechanism to control the orbits of both the electron beams and transmitted light, shielding at least part of the transmitted light to prevent exposure.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Productivity
If a thin photoelectric surface is used to generate electron beams, then electron beam generation efficiency is improved, but transmitted light reaches the target object and exposes the resist, deteriorating writing accuracy
Solution Approach 1:
The patent divides the light shielding function into multiple segments: the photoelectric surface itself provides initial shielding, while additional aperture structures (limit aperture substrate and blanking aperture array mechanism) provide further segmentation of the light path. This multi-level segmentation allows the thin photoelectric surface to maintain its electron generation efficiency while distributed shielding elements progressively block transmitted light from reaching the resist.
Solution Approach 2:
The patent introduces aperture structures as intermediary elements between the photoelectric surface and the target object. These intermediaries (limit aperture substrate and blanking aperture array mechanism) act as mediators that selectively block transmitted light while allowing electron beams to pass through, thereby protecting the resist from light exposure without interfering with electron beam generation and delivery.
2Productivity
If multiple electron beams are used for writing, then throughput is improved, but the complexity of controlling and shielding transmitted light increases
Solution Approach 1:
The patent merges the light shielding function with the electron beam control function into a single integrated system. The blanking aperture array mechanism simultaneously serves to define multiple electron beam paths and block transmitted light for all beams. This merging allows multi-beam writing to achieve high throughput while the unified shielding approach manages light control complexity efficiently across all beams.
Solution Approach 2:
The aperture structures in the patent serve multiple functions: they define the electron beam trajectories, control beam blanking, and simultaneously shield transmitted light. This multi-functionality reduces the need for separate shielding components for each beam, thereby managing system complexity while enabling multi-beam operation for improved throughput.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The solution effectively reduces the intensity of transmitted light reaching the target object, improving writing accuracy by minimizing resist exposure and enhancing pattern precision.
Implementation Method 1
a photoelectric surface configured to receive irradiation of excitation light on a side of a front surface, and generate a plurality of electron beams from a side of a back surface
Data Source
AI summary
According to one aspect of the present invention, an electron beam irradiation apparatus includes a photoelectric surface configured to receive irradiation of excitation light on a side of a front surface, and generate electron beams from a side of a back surface; a blanking aperture array mechanism provided with passage holes corresponding to the electron beams and configured to perform deflection control on each of the plurality of electron beams passing through the passage holes; and an adjustment mechanism configured to adjust at least one of an orbit of transmitted light that passes through at least one of arrangement objects including the photoelectric surface, the blanking aperture array mechanism, and the limit aperture substrate up to the stage and reaches the stage, among an irradiated excitation light, and an orbit of the electron beams, wherein the arrangement objects shield at least a part of the transmitted light.