Multi-Column Electron Beam Layout for Faster Irradiation Coverage
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Solution Overview
Problem
Existing multi-column electron beam irradiation apparatuses face challenges in further reducing the duration of electron beam irradiation, which is essential for meeting increasingly stringent requirements in semiconductor device manufacturing.
Innovation Solution
The apparatus incorporates a storage unit to store information on main and sub-irradiation areas of each column, along with determination units to identify helping and helped columns. The beam scanner of the helping column performs electron beam irradiation in its sub-irradiation area to irradiate the target area of the helped column, optimizing irradiation coverage.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Productivity
If multiple columns are arranged to be adjacent to each other in a multi-column electron beam irradiation apparatus, then the duration of electron beam irradiation can be reduced compared with a single-column apparatus, but the duration of irradiation cannot be further reduced to meet increasingly stringent requirements in semiconductor device manufacturing
Solution Approach 1:
The irradiation area is segmented into main irradiation areas (central parts) and sub-irradiation areas (peripheral parts) for each column. Each column's main irradiation area is assigned to a specific helped column, while sub-irradiation areas are used by helping columns to irradiate adjacent regions. This segmentation allows multiple columns to work simultaneously on different portions of the target area, reducing total irradiation duration.
Solution Approach 2:
Each column is designed to perform multiple functions: it can serve as a helped column for its main irradiation area and simultaneously act as a helping column for adjacent columns' sub-irradiation areas. This multi-functionality maximizes the utilization of all columns, allowing them to contribute to irradiating different portions of the target area concurrently, thereby further reducing irradiation duration.
2Productivity
If columns are configured with overlapping main and sub-irradiation areas to enable helping column functionality, then irradiation coverage is optimized and duration is reduced, but the device complexity increases due to the need for storage units and determination units
Solution Approach 1:
The storage unit stores information on main irradiation areas and sub-irradiation areas of each column in advance, before the irradiation process begins. The determination units pre-calculate and determine which columns are helping columns and which are helped columns based on the target irradiation area and stored information. This preliminary preparation simplifies the actual irradiation control by avoiding complex real-time calculations during operation.
Solution Approach 2:
The determination units act as intermediaries between the storage unit (containing area information) and the beam scanners (performing irradiation). They process the stored information and generate control signals for the beam scanners, simplifying the overall control architecture by separating the complex determination logic from the execution layer.
3Duration of action of stationary object
If helping columns perform electron beam irradiation in their sub-irradiation areas to irradiate helped columns' target areas, then the service life of the electron beam generation device is extended, but the control complexity increases
Solution Approach 1:
Each column's beam scanner autonomously performs irradiation in its assigned area (main or sub-irradiation area) based on control signals from the determination units. The system distributes the irradiation workload across all columns, allowing them to serve themselves by independently managing their own beam generation and scanning operations without requiring complex inter-column coordination during irradiation.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This configuration allows for reduced electron beam irradiation duration and extended service life of the electron beam generation device by effectively utilizing all columns, even those with main irradiation areas not directly included in the target area.
Implementation Method 1
an electron beam generation device that generates an electron beam
Implementation Method 2
a deflector that deflects the electron beam
Data Source
AI summary
A electron beam irradiation apparatus 1 includes a helping column determination unit 11 that determines, as a helping column, a column having a main irradiation area that is not included in a target irradiation area to be irradiated with an electron beam from among a plurality of columns 2 when information on the target irradiation area is input, and a helped column determination unit 12 that determines, as a helped column for the determined helping column, a column that is adjacent to the helping column and has a main irradiation area included in the target irradiation area from among the plurality of columns 2. A beam scanner 5 of the helping column performs a helping irradiation control for performing electron beam irradiation in the sub-irradiation area of the helping column, thereby irradiating the target irradiation area of the helped column with an electron beam.