Electron Beam Region Control for Mixed-Material SEM Analysis
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Solution Overview
Problem
Charged particle beam apparatuses face challenges in analyzing samples with both conductive and non-conductive materials under high vacuum, leading to sample charging, deformation, and reduced analysis reliability, especially during wide-area analysis.
Innovation Solution
A charged particle beam apparatus with region setting means to define electron beam irradiation and prohibited regions, using a control unit to adjust chamber pressure and capture images under different conditions, allowing selective electron beam irradiation and image acquisition based on secondary or backscattered electrons.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Measurement precision
If the sample is disposed under high vacuum and the non-conductive material is irradiated with an electron beam, then high-resolution analysis is achieved, but the sample surface becomes charged causing image disturbances
Solution Approach 1:
The patent applies local quality by differentiating the treatment of different regions on the sample surface. Conductive regions are irradiated with electron beams for high-resolution analysis, while non-conductive regions are protected from irradiation to prevent charging. This spatial differentiation of irradiation conditions allows each region to be treated according to its material properties, resolving the contradiction between achieving high resolution and maintaining image quality.
2Reliability
If the non-conductive material is covered with conductive paste to prevent charging, then charging is prevented, but the work becomes detailed and time-consuming
Solution Approach 1:
The patent replaces the mechanical process of manually applying conductive paste with an automated electronic control system. The region setting means automatically identifies and delineates non-conductive regions, and the electron beam irradiation control means automatically prevents irradiation of these regions. This substitution of manual mechanical work with automated electronic control eliminates the time-consuming and skill-dependent paste application process while achieving the same charging prevention effect.
3Area of stationary object
If wide-area analysis is performed on the conductive material, then comprehensive analysis is achieved, but the analysis cannot be performed due to charging effect once the non-conductive material is irradiated
Solution Approach 1:
The patent applies segmentation by dividing the sample surface into distinct irradiation and non-irradiation regions. The region setting means creates a segmented map identifying which areas are conductive and which are non-conductive. This segmentation allows the electron beam irradiation to be selectively applied only to conductive regions, enabling wide-area analysis of conductive materials while preventing charging in non-conductive regions, thus maintaining analysis reliability across large areas.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
Improves analysis reliability and reduces work time by preventing non-conductive material irradiation under high vacuum, facilitating easy and efficient analysis of samples with mixed materials.
Implementation Method 1
a detector provided in the sample chamber and capable of detecting a secondary or backscattered electron emitted from the sample as a signal
Implementation Method 2
a detector provided in the sample chamber and capable of detecting a secondary or backscattered electron emitted from the sample as a signal
Implementation Method 3
a vacuum pump for adjusting an internal pressure of the sample chamber
Data Source
AI summary
Improved is the reliability of sample analysis performed using a charged particle beam apparatus.The charged particle beam apparatus includes region setting means for setting an irradiation region for irradiating a sample with an electron beam and an irradiation prohibited region for prohibiting the irradiation of the sample with the electron beam using a low-magnification image of the sample captured under low vacuum. In addition, the charged particle beam apparatus includes captured image acquisition means for selectively irradiating the irradiation region with the electron beam with the inside of a sample chamber under high-vacuum and acquiring a high-vacuum SEM image of the irradiation region based on the secondary or backscattered electrons emitted from the irradiation region.