Electron Beam Shaping Apertures for Lower-Shot Reticle Writing
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Solution Overview
Problem
Existing electron beam lithography methods struggle to create complex patterns on semiconductor reticles efficiently, leading to increased shot counts and writing times, which affect throughput and operational costs.
Innovation Solution
A semiconductor apparatus with variable shaped beam technology uses multiple shaping apertures to modify the energy distribution of electron beams, creating patterns with enhanced edge regions and reduced main regions, allowing for fewer shots and reduced writing time.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Manufacturing precision
If conventional electron beam lithography is used to create complex patterns on reticles, then pattern formation is achieved, but shot counts increase and writing time increases
Solution Approach 1:
The patent applies segmentation by dividing the electron beam into multiple shaped beams using a beam splitter and multiple shaping apertures. Each aperture creates a specific pattern shape that can be written in a single shot, eliminating the need for multiple sequential shots to form complex patterns. This directly reduces shot counts and writing time while maintaining pattern formation quality.
Solution Approach 2:
The patent introduces a temporal dimension to the beam shaping process by using a single electron beam that is dynamically shaped and split into multiple patterns over time. The beam splitter and aperture system allows one beam to serve multiple pattern-forming functions sequentially, effectively adding a time-based dimension to resolve the contradiction between pattern complexity and writing efficiency.
2Manufacturing precision
If multiple shots are performed to create patterns on reticles, then complex patterns are formed, but operational costs increase
Solution Approach 1:
By segmenting the electron beam into multiple shaped beams through a beam splitter and aperture system, the patent enables complex patterns to be formed in fewer shots. Each segmented beam carries a specific pattern component that can be written simultaneously or in reduced sequences, directly reducing writing time and operational costs while maintaining pattern complexity.
Solution Approach 2:
The patent applies preliminary action by pre-shaping the electron beam through multiple apertures before it reaches the reticle. The beam is prepared in advance with multiple pattern shapes already formed through the aperture system, eliminating the need for repeated shaping and writing operations. This preliminary preparation reduces the number of shots required and decreases writing time.
3Device complexity
If conventional single beam lithography is used, then equipment complexity is low, but shot counts increase
Solution Approach 1:
The patent introduces a beam splitter and multiple shaping apertures to segment a single electron beam into multiple shaped beams. This segmentation allows complex patterns to be written in fewer shots, improving productivity. The added components increase device complexity slightly, but the trade-off is justified by the significant reduction in shot counts and writing time.
Solution Approach 2:
The patent makes a single electron beam serve multiple functions by using a beam splitter and aperture system to create multiple pattern shapes from one beam source. This multi-functionality allows the lithography system to write complex patterns in fewer shots, improving productivity without requiring multiple separate beam sources or significantly increasing system complexity.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The apparatus achieves improved contrast and reduced shot counts, enhancing throughput and reducing operational costs by optimizing the energy distribution of electron beams, thereby increasing yield and efficiency in semiconductor manufacturing.
Implementation Method 1
electrons from electron source are accelerated and focused in the shape of a beam toward the reticle
Data Source
AI summary
A method includes generating an electron beam from a radiation source; modifying an energy distribution of the electron beam through a first shaping aperture; and exposing a substrate to portions of the electron beam passing through the first shaping aperture. The first shaping aperture comprises blocking strips with a plurality of slots therebetween, a frame surrounding the blocking strips, and a diagonal support connected to the frame and one of the blocking strips.