Electron Beam Sensor with Plasma Shield
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Solution Overview
Problem
Existing electron beam sensors for sterilization in the food packaging industry are large and cannot be directly placed in the electron beam path due to their vacuum-based design, requiring secondary information for measurement, which can lead to incomplete sterilization and inefficient irradiation.
Innovation Solution
A sensor integrated with the electron beam generator's exit window, featuring a conductive layer and an insulating shield, allowing direct electron beam penetration and absorption for intensity measurement without shadowing, with a fraction of electron energy absorbed to generate a current for precise beam intensity detection.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Measurement precision
If a vacuum chamber with conductor is used to measure electron beam intensity, then measurement can be performed, but the sensor becomes large and cannot be placed directly in the electron beam path
Solution Approach 1:
The invention extracts the essential measurement function from the bulky vacuum chamber structure. By removing the vacuum chamber and using only the necessary components (conductive layer on insulating substrate with plasma shield), the sensor size is dramatically reduced while maintaining measurement capability. This allows the sensor to be placed directly in the electron beam path without shadowing the target.
Solution Approach 2:
The invention uses thin film structures - a conductive layer deposited on an insulating substrate - to create a compact sensor that can be placed directly in the electron beam path. The thin film approach replaces the bulky vacuum chamber while maintaining the essential measurement function through the conductive layer's electron absorption properties.
2Manufacturing precision
If the sensor is placed directly in the electron beam path, then uniform irradiation and precise measurement are achieved, but the sensor must be small enough not to shadow the target
Solution Approach 1:
The invention extracts only the essential measurement components, eliminating the large vacuum chamber structure. This creates a miniaturized sensor that can be positioned directly in the electron beam path without creating significant shadowing, thereby enabling uniform irradiation of the target while maintaining precise intensity measurement.
3Measurement precision
If a conductor is exposed to plasma electrons, then the electrostatic fields and plasma electrons influence the electrode output, but protection from plasma is needed
Solution Approach 1:
The invention introduces a plasma shield as an intermediary protective layer between the plasma environment and the conductive measurement layer. This plasma shield, made of insulating material, blocks harmful plasma electrons and electrostatic fields while allowing the conductive layer to accurately measure the primary electron beam intensity without plasma interference.
4Reliability
If a vacuum chamber is used to isolate the sensor from the surrounding environment, then measurement is possible, but the sensor becomes relatively large and located outside the direct electron beam path
Solution Approach 1:
The invention extracts the essential isolation function from the large vacuum chamber structure. By using a plasma shield made of insulating material deposited directly on the sensor components, the necessary environmental isolation is achieved in a compact form factor, allowing the sensor to be placed directly in the electron beam path while maintaining reliability.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
Enables precise measurement of electron beam intensity with minimal extra space requirement, allowing for real-time control and uniform irradiation, ensuring effective sterilization of packaging materials.
Implementation Method 1
A sensor adapted to sense an intensity of an electron beam... at least one area of at least one conductive layer located within the path... A portion of the shield is in contact with the at least one area of the at least one conductive layer
Implementation Method 2
an insulating shield adapted to shield off the at least one area of the at least one conductive layer from plasma and from surrounding environment
Data Source
AI summary
A sensor is adapted to sense the intensity of an electron beam generated by an electron beam generator and exited from the generator through an exit window along a path towards a target within a target area. The sensor comprises at least one area of at least one conductive layer located within the path and connected to a current detector. The area, or areas, of the at least one conductive layer are shielded from the surrounding environment and from the exit window (and from one another when there are more than one area) by a shield. The shield is formed on the exit window. The sensor forms a part of a sensing system.