Electron Beam Shift Correction for Off-Axial Aberration Control
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Solution Overview
Problem
Current electron microscopy techniques are limited by aberrations, particularly off-axial aberrations, which restrict the ability to achieve large image/beam shifts without compromising image resolution, leading to slow and tedious imaging processes that are impractical for investigating larger specimen areas in fields like cellular biology, mineralogy, and semiconductor analysis.
Innovation Solution
A method and system for minimizing off-axial aberrations in electron microscopy by adjusting the electron beam and image beam using deflectors to perform larger shifts and tilts, while maintaining image resolution, utilizing a diffraction correcting component to correct the diffraction pattern and reduce aberrations, allowing for increased productivity and larger field of view without loss of sharpness.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Area of stationary object
If large image/beam shifts are performed in electron microscopy, then the field of view is expanded, but off-axial aberrations increase and image resolution deteriorates
Solution Approach 1:
The patent applies preliminary action by pre-calculating and pre-applying corrective tilts to the electron beam before performing large shifts. The system determines the optimal tilt angles in advance based on the desired shift magnitude and direction, then applies these tilts beforehand to compensate for the off-axial aberrations that will be introduced during the shift. This allows large field of view expansion while maintaining image resolution.
Solution Approach 2:
The patent utilizes parameter changes by dynamically adjusting the tilt angles of the electron beam as a function of the shift magnitude and direction. The system modifies the beam parameters (tilt angles) in real-time to compensate for aberrations introduced by large shifts. This enables the system to maintain optimal image resolution across different field of view sizes by continuously optimizing beam parameters.
2Area of stationary object
If traditional electron microscopy methods are used for large specimen areas, then comprehensive coverage is achieved, but imaging time becomes excessively long
Solution Approach 1:
The patent applies preliminary action by pre-planning the imaging path and pre-calculating optimal beam shifts and tilts for covering large specimen areas. The system determines the most efficient sequence of shifts and tilts in advance, allowing rapid navigation across the specimen without repeated optimization calculations. This dramatically reduces imaging time while ensuring comprehensive specimen area coverage.
Solution Approach 2:
The patent implements continuity of useful action by enabling seamless, continuous scanning across large specimen areas using large beam shifts. Instead of traditional slow, incremental scanning, the system performs large jumps between regions of interest using pre-calculated shift and tilt parameters, maintaining continuous imaging action without interruption or repeated optimization. This reduces total imaging time while covering extensive specimen areas.
3Productivity
If beam shifts are increased to expand field of view, then productivity improves, but off-axial aberrations such as coma and astigmatism worsen
Solution Approach 1:
The patent converts the harmful effect of off-axial aberrations into a beneficial correction mechanism. Instead of simply avoiding large shifts that cause coma and astigmatism, the system deliberately performs these large shifts and then applies specific corrective tilts that transform the aberration pattern. The corrective tilts rotate and reposition the diffraction pattern in a way that compensates for the introduced aberrations, effectively converting the harmful off-axial effects into manageable corrections that enable high-productivity imaging.
Solution Approach 2:
The patent uses parameter changes by dynamically adjusting beam tilt angles as a function of shift magnitude and direction to compensate for off-axial aberrations. The system modifies beam parameters (tilt angles) in real-time based on the current shift state, enabling large shifts that expand field of view while maintaining image quality. This continuous parameter optimization allows productivity improvement without suffering from uncorrected aberrations.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This approach enables significant reductions in image acquisition time and improves resolution and contrast in electron microscopy, allowing for larger field of view imaging without aberration, thus enhancing productivity and applicability in various scientific and industrial applications.
Implementation Method 1
correcting component configured to correct a diffraction pattern in the modified image beam resulting from at least one of beam and image shifts
Data Source
AI summary
A method for reducing throughput time in a sample image acquisition session in transmission electron microscopy comprises: providing an electron microscope comprising a sample component, a beam generator, an adjusting component, and a filtering component; securing a sample by using the sample component; generating an electron beam by using the beam generator; generating an image beam by directing the beam to the sample component; adjusting at least one of the beam and the image beam by using the adjusting component to obtain at least one modified image beam, wherein the adjusting is performed in such a way, that off-axial aberration of the modified image beam is minimized; and filtering the modified image beam via the filtering component to reduce resolution-deteriorating effect of chromatic aberration on the modified image beam resulting from the adjusting of the at least one of the beam and the image beam.